Dr. Yoshinori Nakayama Profile

Dr. Yoshinori Nakayama

Senior Researcher at Hitachi Ltd

SPIE Involvement:

Author

Publications (16)

Proceedings Article | 20 April 2011 Paper

Novel CD-SEM magnification calibration reference of sub-50-nm pitch multi-layer grating with positional identification mark

Yoshinori Nakayama, Jiro Yamamoto, Osamu Inoue, Hiroki Kawada, Shozo Yoneda

Proceedings Volume 7971, 797129 (2011) https://doi.org/10.1117/12.879347

KEYWORDS: Calibration, Diffraction gratings, Silicon, Surface finishing, Polishing, Multilayers, Lithography, Silica, Inspection, Diffraction

Read Abstract +

SPIE Journal Paper | 1 January 2011

Critical dimension-scanning electron microscope magnification calibration with 25-nm pitch grating reference

Yoshinori Nakayama, Jiro Yamamoto, Hiroki Kawada

JM3, Vol. 10, Issue 1, 013021, (January 2011) https://doi.org/10.1117/12.10.1117/1.3565466

KEYWORDS: Calibration, Silicon, Multilayers, Scanning electron microscopy, Diffraction gratings, Electron microscopes, Wet etching, Polishing, Surface finishing, Thin films

Read Abstract +

Proceedings Article | 2 April 2010 Paper

Evaluation of 25-nm pitch SiO[sub]2[/sub]/Si multilayer grating reference using CD-SEM

Hiroki Kawada, Yoshinori Nakayama, Jiro Yamamoto

Proceedings Volume 7638, 76382R (2010) https://doi.org/10.1117/12.848308

KEYWORDS: Calibration, Silicon, Diffraction gratings, Multilayers, Silica, Polishing, Scanning electron microscopy, Wet etching, Surface finishing, Line edge roughness

Read Abstract +

Proceedings Article | 2 April 2010 Paper

Calibration of 25-nm pitch grating reference by high-resolution grazing incidence x-ray diffraction

Yoshiyasu Ito, Kazuhiko Omote, Yuko Okazaki, Yoshinori Nakayama, Hiroki Kawada

Proceedings Volume 7638, 763810 (2010) https://doi.org/10.1117/12.846519

KEYWORDS: Diffraction gratings, Diffraction, Calibration, X-rays, Deep ultraviolet, X-ray diffraction, Grazing incidence, Copper, Laser systems engineering, Silicon

Read Abstract +

Proceedings Article | 24 March 2009 Paper

Sub-50-nm pitch size grating reference for CD-SEM magnification calibration

Yoshinori Nakayama, Jiro Yamamoto, Hiroki Kawada

Proceedings Volume 7272, 727224 (2009) https://doi.org/10.1117/12.814048

KEYWORDS: Calibration, Silicon, Scanning electron microscopy, Wet etching, Silica, Diffraction gratings, Line edge roughness, Analytical research, Diffraction, Silicon films

Read Abstract +

Proceedings Article | 5 April 2007 Paper

Novel CD-SEM calibration reference consisting of 100-nm pitch grating and positional identification mark

Yoshinori Nakayama, Hiroki Kawada, Shozo Yoneda, Takeshi Mizuno

Proceedings Volume 6518, 65183J (2007) https://doi.org/10.1117/12.710772

KEYWORDS: Calibration, Diffraction gratings, Scanning electron microscopy, Silicon, Lithography, Deep ultraviolet, Projection lithography, Dry etching, Photomasks, Diffraction

Read Abstract +

Proceedings Article | 10 May 2005 Paper

Novel CD-SEM calibration reference patterned by EB cell projection lithography

Yoshinori Nakayama, Satoshi Gonda, Ichiko Misumi, Tomizo Kurosawa, Jun-ichiro Kitta, Hisaichi Mine, Katsuhiro Sasada, Shozo Yoneda, Takeshi Mizuno

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.597165

KEYWORDS: Calibration, Diffraction gratings, Diffraction, Photomasks, Projection lithography, Silicon, Dry etching, Deep ultraviolet, Metrology, Semiconducting wafers

Read Abstract +

Proceedings Article | 5 September 2001 Paper

Up-to-date activities of PXL (proximity x-ray lithography)

Yasuji Matsui, Takao Taguchi, Yoshinori Nakayama, Yukiko Kikuchi, Shinji Tsuboi, Hiroaki Sumitani

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438381

KEYWORDS: Photomasks, Optical alignment, Distortion, Lithography, Overlay metrology, Optical lithography, Etching, Semiconducting wafers, Transistors, X-rays

Read Abstract +

Proceedings Article | 5 September 2001 Paper

Precise x-ray mask writing technology using advanced 100-kV EB writer EB-X3

Yoshinori Nakayama, Hiroshi Watanabe, Shinji Tsuboi, Hajime Aoyama, Mizunori Ezaki, Yasuji Matsui, Tetsuo Morosawa, Masatoshi Oda

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438364

KEYWORDS: Photomasks, X-rays, X-ray technology, Electrons, Distortion, Aluminum, Mask making, Image processing, Control systems, X-ray lithography

Read Abstract +

Proceedings Article | 20 August 2001 Paper

Application of advanced 100-kV EB writer EB-X3 for 100-nm node x-ray mask fabrication

Hiroshi Watanabe, Yoshinori Nakayama, Shinji Tsuboi, Mizunori Ezaki, Hajime Aoyama, Yasuji Matsui, Tetsuo Morosawa, Masatoshi Oda

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436670

KEYWORDS: Photomasks, X-rays, Temperature metrology, Objectives, Mask making, Critical dimension metrology, X-ray technology, Acquisition tracking and pointing, Reticles, X-ray lithography

Read Abstract +

Proceedings Article | 21 July 2000 Paper

Printing characteristics of proximity x-ray lithography and comparison with optical lithography for 100-nm node and below

Masaki Hasegawa, Yoshinori Nakayama, K. Yamaguchi, Tsuneo Terasawa, Yasuji Matsui

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390116

KEYWORDS: Optical lithography, Photomasks, Lithography, Optical proximity correction, Printing, X-ray lithography, Resolution enhancement technologies, Scanning electron microscopy, Photomicroscopy, Instrument modeling

Read Abstract +

Proceedings Article | 21 July 2000 Paper

Delineation performances of advanced 100-kV EB writer on x-ray membrane mask

Yoshinori Nakayama, Hajime Aoyama, Shinji Tsuboi, Hiroshi Watanabe, Yukiko Kikuchi, Mizunori Ezaki, Yasuji Matsui, Tetsuo Morosawa, Kenichi Saito, Shigehisa Ohki, Tadahito Matsuda

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390033

KEYWORDS: Photomasks, X-rays, Image processing, Distortion, Silicon carbide, Silicon, Lithography, Mask making, X-ray lithography, Interferometers

Read Abstract +

Proceedings Article | 7 July 1997 Paper

Highly accurate alignment technology for electron-beam lithography in mix-and-match with optical stepper

Yoshinori Nakayama, Yasuko Gotoh, Norio Saitou, Hajime Hayakawa, Minoru Sasaki

Proceedings Volume 3048, (1997) https://doi.org/10.1117/12.275784

KEYWORDS: Optical alignment, Lithography, Distortion, Semiconducting wafers, Overlay metrology, Optics manufacturing, Manufacturing, Wafer-level optics, Excimer lasers, Phase shifts

Read Abstract +

Proceedings Article | 3 November 1994 Paper

Silicon shaping mask for electron-beam cell projection lithography

Hidetoshi Satoh, Yoshinori Nakayama, Norio Saitou, T. Kagami

Proceedings Volume 2254, (1994) https://doi.org/10.1117/12.191922

KEYWORDS: Photomasks, Silicon, Projection lithography, Semiconducting wafers, Vestigial sideband modulation, Etching, Lithography, X-ray technology, Plasma etching, Scanning electron microscopy

Read Abstract +

Proceedings Article | 1 May 1994 Paper

New submicron dimension reference for electron-beam metrology system

Yoshinori Nakayama, Kouji Toyoda

Proceedings Volume 2196, (1994) https://doi.org/10.1117/12.174166

KEYWORDS: Metrology, Optical testing, Calibration, Diffraction gratings, Interferometers, Lithography, Crystals, Silicon, Diffraction, Submicron lithography

Read Abstract +

Proceedings Article | 24 June 1993 Paper

Highly accurate calibration method of electron-beam cell projection lithography

Yoshinori Nakayama, Yasunari Sohda, Norio Saitou, Hiroyuki Itoh

Proceedings Volume 1924, (1993) https://doi.org/10.1117/12.146503

KEYWORDS: Calibration, Silicon, Photomasks, Semiconducting wafers, Projection lithography, Scanning electron microscopy, Mask making, Etching, Surface finishing, Beam shaping

Read Abstract +

Showing 5 of 16 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years