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Yoshiyuki Sato
at Toshiba Semiconductor Co
SPIE Involvement:
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Publications (1)
Proceedings Article | 16 April 2008 Paper
Defect criticality index (DCI): a new methodology to significantly improve DOI sampling rate in a 45nm production environment
Yoshiyuki Sato, Yasuyuki Yamada, Yasuhiro Kaga, Yuuichiro Yamazaki, Masami Aoki, David Tsui, Chris Young, Ellis Chang
Proceedings Volume 6922, 692213 (2008) https://doi.org/10.1117/12.771917
KEYWORDS: Scanning electron microscopy, Inspection, Semiconducting wafers, Particles, Wafer inspection, Defect detection, Environmental sensing, Defect inspection, Environmental monitoring, Metals
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