Mr. Yu Ma Profile

Yu Ma

at Tsinghua Univ Shenzhen International Graduate School

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Proceedings Article | 27 November 2024 Paper

High-accuracy and real-time phase solution algorithm based on extended Kalman filter for multi-degree-of-freedom grating interferometer

Yu Ma, Yifeng Wang, Sihan Lu, Shengtong Wang, Xinghui Li

Proceedings Volume 13236, 132360P (2024) https://doi.org/10.1117/12.3036312

KEYWORDS: Signal filtering, Interferometers, Optical gratings, Heterodyning, Field programmable gate arrays

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The heterodyne signal of a grating interferometer is formed by the interference of two coherent light beams with a frequency difference. The frequency of the heterodyne signal is equal to the frequency difference of the two light beams. When one beam undergoes Doppler frequency shift, the heterodyne signal experiences a corresponding frequency change. By calculating the phase difference between the reference and measurement heterodyne signals of the grating interferometer, the displacement of an object can be determined. The accuracy and real-time performance of solving this phase difference affect the overall performance of the grating interferometer. Multi-degree-of-freedom grating interferometers play a crucial role in high-precision fields such as lithography machines and astronomical telescope mirror alignment. The phase calculation of interference signals is an important component. Current algorithms hard to balance real-time performance and accuracy effectively. Therefore, to enhance both the precision and real-time performance of grating interferometers, this paper proposes using an extended Kalman filter (EKF) method to solve the phase difference. In the EKF model, the state variables are set as the phase, frequency, and amplitude of the sinusoidal signal, and the calculation is performed through prediction and correction steps. Since the Kalman filter algorithm only uses the current sampling point data for model calculation, it has lower latency. The algorithm was deployed on an FPGA to test the signals generated by a signal generator, achieving a measurement accuracy of 0.03° and a resolution of 0.01°. This research contributes to improving the real-time performance and accuracy of grating interferometers.

Proceedings Article | 20 November 2024 Paper

A grating interferometer for improving optical subdivision in Z-axis measurement

Pengbo Zhao, Lvye Gao, Can Cui, Yu Ma, Menghan Yang, Lifu Liu, Xinghui Li

Proceedings Volume 13241, 132410Z (2024) https://doi.org/10.1117/12.3036434

KEYWORDS: Interferometers, Optical gratings, Beam splitters, Reflection, Optical testing, Heterodyning, Sensors, Polarized light, Polarization, Laser frequency

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The grating interferometer, with its advantages of high resolution, low cost, and robustness in various environmental conditions, plays an irreplaceable role in the field of ultra-precision measurement. However, the existing Z-axis measurement methods have relatively low resolution, which limits their precision to atomic levels. In order to further improve the accuracy of the heterodyne grating interferometer, this paper proposes an improved optical path for increasing the optical subdivision number in the Z direction. By utilizing a combination of beam splitters and polarizing beam splitters, the Z direction achieves quadruple optical subdivision, enabling sub-nanometer level measurements. Experimental verification demonstrates that this approach can achieve a Z-direction resolution better than 0.2nm, with a 50nm travel repeatable accuracy of 0.5nm, a 50nm step size linear accuracy of 0.04%, and a system stability of 4nm within 5 minutes. The periodic nonlinear error is better than 1nm. In addition, The proposed improved optical path in the Z direction can be further extended to a three-degree-of-freedom measurement system, making it more compact and suitable for achieving sub-nanometer level measurements. This method has the advantages of simple installation, high precision, and stability. It holds significant practical value in industrial production, and can be applied in precision mechanical manufacturing, scanning beam interferometric lithography, and other ultraprecision positioning applications.

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