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Yuji Yada
at JSR Engineering Co Ltd
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Publications (1)
Proceedings Article | 11 April 2006 Paper
Application of high-refractive index fluid to KrF-immersion lithography
Yuji Yada, Koji Ito, Yoshikazu Yamaguchi, Taiichi Furukawa, Takashi Miyamatsu, Yong Wang, Katsuhiko Hieda, Tsutomu Shimokawa
Proceedings Volume 6153, 61531W (2006) https://doi.org/10.1117/12.655983
KEYWORDS: Photoresist materials, Lithography, Refractive index, Semiconducting wafers, Immersion lithography, Microfluidics, Absorbance, Transmittance, 193nm lithography, Water
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