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Yujiro Hikida
at Nikon Corp
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Author
Publications (3)
Proceedings Article | 20 March 2018 Paper
Enhancement of ArF immersion scanner system for advanced device node manufacturing
Yujiro Hikida, Akira Hayakawa, Yoshihiro Teshima, Tomonori Dosho, Noriaki Kasai, Yasushi Yoda, Kazuo Masaki, Yuichi Shibazaki
Proceedings Volume 10587, 105870X (2018) https://doi.org/10.1117/12.2297302
KEYWORDS: Semiconducting wafers, Scanners, Optical alignment, Overlay metrology, Control systems, Manufacturing, Lithography, Process control
Proceedings Article | 24 March 2017 Paper
On-product overlay improvement with an enhanced alignment system
Proceedings Volume 10147, 1014716 (2017) https://doi.org/10.1117/12.2257659
KEYWORDS: Semiconducting wafers, Optical alignment, Lithography, Manufacturing, Chemical mechanical planarization, Precision measurement, Overlay metrology, Distortion, Optical parametric oscillators, Systems modeling, 3D modeling
Proceedings Article | 18 March 2015 Paper
Latest performance of ArF immersion scanner NSR-S630D for high-volume manufacturing for 7nm node
Takayuki Funatsu, Yusaku Uehara, Yujiro Hikida, Akira Hayakawa, Satoshi Ishiyama, Toru Hirayama, Hirotaka Kono, Yosuke Shirata, Yuichi Shibazaki
Proceedings Volume 9426, 942617 (2015) https://doi.org/10.1117/12.2085735
KEYWORDS: Reticles, Semiconducting wafers, Overlay metrology, Scanners, Transmittance, Distortion, High volume manufacturing, Optical parametric oscillators, Wavefronts, Software development
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