Dr. Zdenek Benes Profile

Dr. Zdenek Benes

at EPFL

SPIE Involvement:

Author

Publications (6)

SPIE Journal Paper | 25 January 2018

Light refocusing with up-scalable resonant waveguide gratings in confocal prolate spheroid arrangements

Giorgio Quaranta, Guillaume Basset, Zdenek Benes, Olivier J.F. Martin, Benjamin Gallinet

JNP, Vol. 12, Issue 01, 016004, (January 2018) https://doi.org/10.1117/12.10.1117/1.JNP.12.016004

KEYWORDS: Beam steering, Waveguides, Confocal microscopy, Optical filters, Light, Cameras, Electron beams, Transparency, Mirrors, Optical design

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Proceedings Article | 30 March 2010 Paper

A method to characterize pattern density effects: chemical flare and develop loading

Linda Sundberg, Gregory Wallraff, Alexander Friz, Amy Zweber, Zdenek Benes, Robert Lovchik, Emmanuel Delamarche, William Hinsberg

Proceedings Volume 7639, 76392S (2010) https://doi.org/10.1117/12.849145

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Liquids, Silicon, Ions, Reactive ion etching, Wafer-level optics, Plasma, Photoresist developing, Optical lithography

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Proceedings Article | 1 April 2009 Paper

Criteria for success in e-beam resists

A. E. Zweber, T. Komizo, J. Levin, Z. Benes

Proceedings Volume 7273, 72730K (2009) https://doi.org/10.1117/12.816048

KEYWORDS: Photoresist materials, Line edge roughness, Photomasks, Etching, Photoresist developing, Chromium, Resistance, Interfaces, Thin film coatings, Metrology

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Proceedings Article | 1 November 2007 Paper

Pattern density and process related CD corrections at 32nm node

Zdenek Benes, Jun Kotani

Proceedings Volume 6730, 67304A (2007) https://doi.org/10.1117/12.747599

KEYWORDS: Etching, Critical dimension metrology, Photomasks, Photoresist processing, Cadmium, Modulation, Coating, Plasma etching, Materials processing, Reticles

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Proceedings Article | 20 October 2006 Paper

Chemical flare long-range proximity effects in photomask manufacturing with chemically amplified resists

Daniel Sullivan, Yusuke Okawa, Kazuhiko Sugawara, Zdenek Benes, Jun Kotani

Proceedings Volume 6349, 634905 (2006) https://doi.org/10.1117/12.686732

KEYWORDS: Photomasks, Modulation, Manufacturing, Chemically amplified resists, Industrial chemicals, Photoresist materials, Critical dimension metrology, Reactive ion etching, Photoresist processing, Standards development

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Proceedings Article | 17 December 2003 Paper

Resist heating effect on e-beam mask writing at 75 kV and 60 A/cm²

Zdenek Benes, Christina Deverich, Chester Huang, Mark Lawliss

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517513

KEYWORDS: Critical dimension metrology, Chemically amplified resists, Cadmium, Scanning electron microscopy, Electron beam lithography, Mask making, Photomasks, Electron beams, Beam shaping, Quartz

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Showing 5 of 6 publications

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