Mr. Parkson W. Chen Profile

Parkson W. Chen

at Taiwan Mask Corp

SPIE Involvement:

Author

Proceedings Article | 28 May 2003 Paper

Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment

Rik Jonckheere, Vicky Philipsen, Gerd Scheuring, Frank Hillmann, Hans-Jurgen Brueck, Volodymyr Ordynskyy, Kai Peter, Andrew Hourd, Thomas Schaetz, Shiuh-Bin Chen, Parkson Chen, Karl Sommer

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515116

KEYWORDS: Scanning electron microscopy, Photomasks, Pellicles, Reticles, Calibration, Semiconducting wafers, Critical dimension metrology, Binary data, 193nm lithography, Metrology

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Proceedings Article | 28 May 2003 Paper

Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec DUV tool

Gerd Scheuring, Alexander Petrashenko, Stefan Doebereiner, Frank Hillmann, Hans-Jurgen Bruck, Andrew Hourd, Anthony Grimshaw, Gordon Hughes, Shiuh-Bin Chen, Parkson Chen, Thomas Schatz, Thomas Struck, Paul van Adrichem, Herman Boerland, Sigrid Lehnigk

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515107

KEYWORDS: Photomasks, Critical dimension metrology, Reticles, Inspection, Deep ultraviolet, Metrology, Binary data, Objectives, Environmental sensing, Cameras

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Proceedings Article | 28 May 2003 Paper

Implementation of 248-nm-based CD metrology for advanced reticle production

Andrew Hourd, Anthony Grimshaw, Gerd Scheuring, Christian Gittinger, Stefan Dobereiner, Frank Hillmann, Hans-Jurgen Bruck, Hans Hartmann, Volodymyr Ordynskyy, Kai Peter, Shiuh-Bin Chen, Parkson Chen, Rik Jonckheere, Vicky Philipsen, Thomas Schatz, Karl Sommer

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515114

KEYWORDS: Lamps, Reticles, Critical dimension metrology, Metrology, Contamination, Deep ultraviolet, Photomasks, Reliability, Time metrology, Manufacturing

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Proceedings Article | 27 December 2002 Paper

Reliable subnanometer repeatability for CD metrology in a reticle production environment

Andrew Hourd, Anthony Grimshaw, Gerd Scheuring, Christian Gittinger, Stefan Doebereiner, Frank Hillmann, Hans-Juergen Brueck, Shiuh-Bin Chen, Parkson Chen, Rik Jonckheere, Vicky Philipsen, Hans Hartmann, Volodymyr Ordynskyy, Kai Peter, Thomas Schaetz, Karl Sommer

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468090

KEYWORDS: Reticles, Metrology, Deep ultraviolet, Photomasks, Critical dimension metrology, Line edge roughness, Binary data, Manufacturing, Computed tomography, Image processing

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Proceedings Article | 16 August 2002 Paper

Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: an overview of preliminary results

Andrew Hourd, Anthony Grimshaw, Gerd Scheuring, Christian Gittinger, Hans-Juergen Brueck, Shiuh-Bin Chen, Parkson Chen, Hans Hartmann, Volodymyr Ordynskyy, Rik Jonckheere, Vicky Philipsen, Thomas Schaetz, Karl Sommer

Proceedings Volume 4764, (2002) https://doi.org/10.1117/12.479349

KEYWORDS: Photomasks, Critical dimension metrology, Deep ultraviolet, Reticles, Metrology, Semiconductors, Optics manufacturing, Reliability, Optical imaging, Manufacturing

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Proceedings Article | 18 December 1998 Paper

Assessment of mask-making in Taiwan and the Asia Pacific region (Presentation Only)

Parkson Chen

Proceedings Volume 3546, (1998) https://doi.org/10.1117/12.332825

KEYWORDS: Mask making, Photomasks, Optical proximity correction, Photomask technology, Ear, Etching, Manufacturing, Ions, Silicon

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Proceedings Article | 1 January 1992 Paper

Alternative to die-to-database mask inspection

Parkson Chen

Proceedings Volume 1604, (1992) https://doi.org/10.1117/12.56941

KEYWORDS: Inspection, Photomasks, Reticles, Databases, Data centers, Ions, Defect inspection, Defect detection, Computing systems, Computed tomography

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Showing 5 of 7 publications

SPIE Conference Volume | 10 May 2007

Photomask and Next-Generation Lithography Mask Technology XIV

Conference Committee Involvement (4)

Photomask and Next Generation Lithography Mask Technology XIV

17 April 2007 | Yokohama, Japan

Photomask and Next-Generation Lithography Mask Technology XIII

18 April 2006 | Yokohama, Japan

Photomask and Next-Generation Lithography Mask Technology XII

13 April 2005 | Yokohama, Japan

Photomask and NGL Mask Technology X

16 April 2003 | Yokohama, Japan

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