The influence of mid-spatial frequency surface error on illumination pupil in the lithography illumination system is analyzed. The far-field distribution of the pupil under the influence of the mid-spatial frequency surface error is derived. Using the actual manufactured surface error combined with commercial optical design software to simulate the relay lens group in the photolithography illumination, analyze the influence of the mid-spatial frequency surface error in different fields of view on the pupil ellipticity, X-direction pupil balance and Y-direction pupil balance. This simulation method can be used at the design stage by using the actual manufactured profile, which provides a reference for optical design.
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