EUV actinic blank inspection: from prototype to production

Anna Tchikoulaeva; Hiroki Miyai; Tomohiro Suzuki; Kiwamu Takehisa; Haruhiko Kusunose; Takeshi Yamane; Tsuneo Terasawa; Hidehiro Watanabe; Soichi Inoue; Ichiro Mori

doi:10.1117/12.2011776

1 April 2013 EUV actinic blank inspection: from prototype to production

Anna Tchikoulaeva, Hiroki Miyai, Tomohiro Suzuki, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Tsuneo Terasawa, Hidehiro Watanabe, Soichi Inoue, Ichiro Mori

Author Affiliations +

Proceedings Volume 8679, Extreme Ultraviolet (EUV) Lithography IV; 86790I (2013) https://doi.org/10.1117/12.2011776
Event: SPIE Advanced Lithography, 2013, San Jose, California, United States

Abstract

The availability of actinic blank inspection is one of the key milestones for EUV lithography on the way to high volume manufacturing. Placed at the very beginning of the mask manufacturing flow, blank inspection delivers the most critical data set for the judgment of the initial blank quality and final mask performance. From all actinic metrology tools proposed and discussed over the last years, actinic blank inspection (ABI) tool is the first one to reach the pre-production status. In this paper we give an overview of EIDEC-Lasertec ABI program, provide a description of the system and share the most recent performance test results of the tool for 16 nm technology node.

Citation Download Citation

Anna Tchikoulaeva, Hiroki Miyai, Tomohiro Suzuki, Kiwamu Takehisa, Haruhiko Kusunose, Takeshi Yamane, Tsuneo Terasawa, Hidehiro Watanabe, Soichi Inoue, and Ichiro Mori "EUV actinic blank inspection: from prototype to production", Proc. SPIE 8679, Extreme Ultraviolet (EUV) Lithography IV, 86790I (1 April 2013); https://doi.org/10.1117/12.2011776

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