Presentation
5 October 2023 Fundamental limits to large-area plasmonic field enhancements
Zhaowei Dai, Owen D. Miller
Author Affiliations +
Abstract
For applications from optical sensing to photoemission spectroscopy, it is desirable to pattern a plasmonic surface and enhance, over a large area, the field intensity near the surface. What is the largest possible large-area field enhancement? Here, we show a simple semi-analytical bound, based primarily on power-conservation principles, that dictates the fundamental limits to large-area plasmonic field enhancements. Our bounds depend only on the material permittivity and the angle of incidence. Our theory predicts that > 1000X field enhancements are possible with patterned silver metasurfaces. Through numerical optimization, we discover structures that achieve enhancements over 97% of the fundamental limit, for designable wavelengths across the visible and near-infrared.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhaowei Dai and Owen D. Miller "Fundamental limits to large-area plasmonic field enhancements", Proc. SPIE PC12648, Plasmonics: Design, Materials, Fabrication, Characterization, and Applications XXI, PC126481C (5 October 2023); https://doi.org/10.1117/12.2677539
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KEYWORDS
Plasmonics

Design and modelling

Imaging spectroscopy

Silver

2D materials

Gold

Metals

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