Holographic Grating Development at Lockheed Palo Alto Research Laboratory

R. C. Smithson; T. P. Pope

doi:10.1117/12.965632

10 February 1981 Holographic Grating Development at Lockheed Palo Alto Research Laboratory

R. C. Smithson, T. P. Pope

Proceedings Volume 0240, Periodic Structures, Gratings, Moire Patterns, and Diffraction Phenomena I; (1981) https://doi.org/10.1117/12.965632
Event: 24th Annual Technical Symposium, 1980, San Diego, United States

Abstract

During the past several years the Lockheed Palo Alto Research Laboratory has developed a capability to produce holographic optical elements using a variety of production techniques. Gratings produced have included reflective gratings using both overcoated photoresist and ion etched substrates up to 15 cm. in diameter. Conventional bleached photographic transmission gratings have also been produced for some applications. Methods in use at Lockheed are capable of producing extremely rugged gratings which can withstand both physical abuse and high incident flux levels. Photoresist coating techniques have been developed which are sufficiently precise that optical quality obtained with reflective gratings is limited primarily by the quality of the construction optics. Both high and low efficiency gratings have been produced for a variety of applications. This paper presents an overview of Lockheed holographic grating technology.

Citation Download Citation

R. C. Smithson and T. P. Pope "Holographic Grating Development at Lockheed Palo Alto Research Laboratory", Proc. SPIE 0240, Periodic Structures, Gratings, Moire Patterns, and Diffraction Phenomena I, (10 February 1981); https://doi.org/10.1117/12.965632

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