Quantitative Sub-Micrometer Linewidth Determination Using Electron Microscopy

Stephen Jensen; Gary Hembree; Jay Marchiando; Dennis Swyt

doi:10.1117/12.931879

28 July 1981 Quantitative Sub-Micrometer Linewidth Determination Using Electron Microscopy

Stephen Jensen, Gary Hembree, Jay Marchiando, Dennis Swyt

Proceedings Volume 0275, Semiconductor Microlithography VI; (1981) https://doi.org/10.1117/12.931879
Event: 1981 Microlithography Conferences, 1981, San Jose, United States

Abstract

Quantitative determination of sub-micrometer linewidths in semiconductor devices and masks is demonstrated utilizing an approach employing complementary experimental measurements and theoretical modeling. Experimental measurements are performed utilizing the Microlength Calibrating Electron Probe (MCEP), a new facility at the National Bureau of Standards consisting of a scanning electron microscope modified to incorporate a scanning stage and laser-interferometer position measurement system. Automated data acquisition and analysis for the MCEP are achieved through interfacing to a laboratory minicomputer. Theoretical modeling based on Monte Carlo calculations provides a basis for selection of the position in the experimentally measured backscatter electron intensity profile that corresponds to the actual material line edge. A measurement on a photomask is shown which illustrates the utility of the MCEP facility and the Monte Carlo modeling calculations for accurate measurement of sub-micrometer linewidths.

Citation Download Citation

Stephen Jensen, Gary Hembree, Jay Marchiando, and Dennis Swyt "Quantitative Sub-Micrometer Linewidth Determination Using Electron Microscopy", Proc. SPIE 0275, Semiconductor Microlithography VI, (28 July 1981); https://doi.org/10.1117/12.931879

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