Making Of Secondary Standards From National Bureau Of Standards (NBS) Photomask Standard

ManLung Auyeung

doi:10.1117/12.933674

15 October 1982 Making Of Secondary Standards From National Bureau Of Standards (NBS) Photomask Standard

ManLung Auyeung

Proceedings Volume 0342, Integrated Circuit Metrology I; (1982) https://doi.org/10.1117/12.933674
Event: 1982 Technical Symposium East, 1982, Arlington, United States

Abstract

To minimize the risk of damaging expensive high quality linewidth standards, secondary standards can be made for use in a production environment. This paper discribes a simple method of estimating the total uncertainty of secondary standards. The method includes procedures for estimating random and systemetic errors of the linewidth measuring instrument used to characterize the secondary standards. Given the total uncertainty of the NBS SRM474 standard, the total uncertainty of the secondary standards may be estimated.

Citation Download Citation

ManLung Auyeung "Making Of Secondary Standards From National Bureau Of Standards (NBS) Photomask Standard", Proc. SPIE 0342, Integrated Circuit Metrology I, (15 October 1982); https://doi.org/10.1117/12.933674

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