Automatic Intensity Mapping Of Stepper Illumination At The Wafer Plane

Randy Kodama

doi:10.1117/12.947772

23 July 1985 Automatic Intensity Mapping Of Stepper Illumination At The Wafer Plane

Randy Kodama

Proceedings Volume 0538, Optical Microlithography IV; (1985) https://doi.org/10.1117/12.947772
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

A light intensity monitor has been developed for automated intensity mapping of the stepper exposure field at the wafer plane. The hardware consists of a microprocessor controlled light monitor which continuously collects and analyzes data obtained from multiple exposures in the illumination field.

Citation Download Citation

Randy Kodama "Automatic Intensity Mapping Of Stepper Illumination At The Wafer Plane", Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); https://doi.org/10.1117/12.947772

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