EXAFS Measurements Of Ion-Implanted Amorphous Surface Layers

C. E. Bouldin; R. A. Forman; M. I. Bell; E. P. Donovan; G. K. Hubler

doi:10.1117/12.936597

12 August 1986 EXAFS Measurements Of Ion-Implanted Amorphous Surface Layers

C. E. Bouldin, R. A. Forman, M. I. Bell, E. P. Donovan, G. K. Hubler

Proceedings Volume 0690, X-Rays in Materials Analysis: Novel Applications and Recent Developments; (1986) https://doi.org/10.1117/12.936597
Event: 30th Annual Technical Symposium, 1986, San Diego, United States

Abstract

EXAFS measurements of ion-damaged amorphous Ge (a-Ge) show that low temperature annealing causes a structural relaxation in the as-implanted a-Ge. It is found that there is a sharpening of the first shell in the radial distribution but no change occurs in the first-shell distance or coordination number. No higher shells in the radial distribution are observed, either before or after annealing, indicating that these shells remain highly disordered. The observed structural relaxation is an amorphous-amorphous transition; no nucleation of microcrystals takes place. EXAFS measurements are made using conversion electron detection (CEEXAFS), which is essentially total electron yield detection in ambient conditions, allowing the EXAFS measurements to be near-surface sensitive with a sampling depth of 600 to 800 Å.

Citation Download Citation

C. E. Bouldin, R. A. Forman, M. I. Bell, E. P. Donovan, and G. K. Hubler "EXAFS Measurements Of Ion-Implanted Amorphous Surface Layers", Proc. SPIE 0690, X-Rays in Materials Analysis: Novel Applications and Recent Developments, (12 August 1986); https://doi.org/10.1117/12.936597

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