Fabrication Of Photoresist Masks For Submicrometer Surface Relief Gratings

Lifeng Li; Mai Xu; George I. Stegeman; Colin T. Seaton

doi:10.1117/12.942328

10 March 1988 Fabrication Of Photoresist Masks For Submicrometer Surface Relief Gratings

Lifeng Li, Mai Xu, George I. Stegeman, Colin T. Seaton

Proceedings Volume 0835, Integrated Optical Circuit Engineering V; (1988) https://doi.org/10.1117/12.942328
Event: Cambridge Symposium on Fiber Optics and Integrated Optoelectronics, 1987, Cambridge, MA, United States

Abstract

A method of fabricating photoresist grating masks with Shipley's 1400 series positive photoresist by monitoring the negative first-order diffraction efficiency during the photoresist development is presented. The relationship between the monitoring curve and the mask profile evolution is examined.

Citation Download Citation

Lifeng Li, Mai Xu, George I. Stegeman, and Colin T. Seaton "Fabrication Of Photoresist Masks For Submicrometer Surface Relief Gratings", Proc. SPIE 0835, Integrated Optical Circuit Engineering V, (10 March 1988); https://doi.org/10.1117/12.942328

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