High power DUV lasers for material processing

Toshio Mimura; Kouji Kakizaki; Hiroaki Oizumi; Masakazu Kobayashi; Junichi Fujimoto; Takashi Matsunaga; Hakaru Mizoguchi

doi:10.1117/12.2247870

9 November 2016 High power DUV lasers for material processing

Toshio Mimura, Kouji Kakizaki, Hiroaki Oizumi, Masakazu Kobayashi, Junichi Fujimoto, Takashi Matsunaga, Hakaru Mizoguchi

Author Affiliations +

Proceedings Volume 10016, High-Power Lasers and Applications VIII; 1001603 (2016) https://doi.org/10.1117/12.2247870
Event: SPIE/COS Photonics Asia, 2016, Beijing, China

Abstract

A frontier in laser machining has been required by material processing in DUV region because it is hard to get high power solid-state lasers in this spectral region. DUV excimer lasers are the only solution, and now the time has come to examine the new applications of material processing with DUV excimer lasers. The excimer lasers at 193nm and 248nm have been used in the semiconductor manufacturing for long years, and have field-proven stability and reliability. The high photon energy of 6.4 eV at 193nm is expected to interact directly with the chemical bond of hard-machining materials, such as CFRP, diamond and tempered glasses. We report the latest results of material processing by 193nm high power DUV laser.

Citation Download Citation

Toshio Mimura, Kouji Kakizaki, Hiroaki Oizumi, Masakazu Kobayashi, Junichi Fujimoto, Takashi Matsunaga, and Hakaru Mizoguchi "High power DUV lasers for material processing", Proc. SPIE 10016, High-Power Lasers and Applications VIII, 1001603 (9 November 2016); https://doi.org/10.1117/12.2247870

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