Open Access Paper
26 June 2018 Front Matter: Volume 10544
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 10544, including the Title Page, Copyright information, Table of Contents, Introduction (if any), and Conference Committee listing.

The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org.

The papers reflect the work and thoughts of the authors and are published herein as submitted. The publisher is not responsible for the validity of the information or for any outcomes resulting from reliance thereon.

Please use the following format to cite material from these proceedings:

Author(s), “Title of Paper,” in Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XI, edited by Georg von Freymann, Winston V. Schoenfeld, Raymond C. Rumpf, Proceedings of SPIE Vol. 10544 (SPIE, Bellingham, WA, 2018) Seven-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510615731

ISBN: 9781510615748 (electronic)

Published by

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Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:

  • The first five digits correspond to the SPIE volume number.

  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, OA, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.

Authors

Numbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Allen, Frances I., 0A

Balčiūnas, Evaldas, 1E

Baltriukienė, Daiva, 1E

Bock, Wojtek J., 0F

Bove, V. Michael, Jr., 0D

Brecher, Christian, 0M

Brozio, Matthias, 0M

Cabrini, Stefano, 0A

Calafiore, Giuseppe, 0A

Čekanavičius, Laurynas, 17

Chatterjee, Subhashri, 0X, 16

Chen, Chao-Ting, 0Q

Chen, Peng-Jyun, 0Q

Chiang, Yu-Hsin, 0Q

Coldrick, Benjamin, 1B

Darchevits, Bar, 1A

Datta, Bianca, 0D

Dhuey, Scott, 0A

Duadi, Hamootal, 1A

Ebendorff-Heidepriem, Heike, 0J

Eftimov, Tinko, 0F

Eifler, Matthias, 12

Esen, Cemal, 0W

Faniayeu, I., 0X

Fratini, Antonio, 1B

Freutel, Simon, 0M

Fridman, Moti, 1A

Gadonas, Roaldas, 16

Gailevičius, Darius, 0H, 16, 17

Gershenfeld, Neil, 0D

Gibson, Brant C., 0J

Gorb, Stanislav, 0W

Gordon, Neil, 1B

Greentree, Andrew D., 0J

Grigalevičiūtė, Giedre, 1E

Gurevich, Evgeny L., 0W

Heffernan, Ashleigh H., 0J

Hering, Julian, 12

Hofherr, Linda, 12

Hwang, SoonHyoung, 07

Inomata, Toru, 0O

Ishikawa, Masatoshi, 19

Janik, Monika, 0F

Jeon, Sohee, 07

Jeong, Jun Ho, 07

Jolly, Sundeep, 0D

Jones, Adam M., 0N

Jonušauskas, Linas, 16, 17, 1E

Juodkazis, Saulius, 0H, 16

Karydis, Thrasyvoulous, 0D

Katkus, Tomas, 0H

Kim, Junoh, 1F

Kinzel, Edward C., 0C

Kirchner, Johannes, 0E

Kitagawa, Seiichiro, 0O

Klein, Avi, 1A

Koba, Marcin, 0F

Koo, Gyo Hyun, 1G

Koshelev, Alexander, 0A

Kostecki, Roman, 0J

Kovalev, Alexander, 0W

Langford, Will, 0D

Lee, Junsik, 1F

Lu, Yang, 1B

Lum, Paul, 0A

Maksymov, Ivan, 0J

Malinauskas, Mangirdas, 0H, 16, 17, 1E

Manske, Eberhard, 0E

Masri, Gilad, 1A

McLeod, Robert R., 0N

Menduni, Francesco, 1B

Mezentsev, Vladimir, 1B

Miller, David B., 0N

Mizeikis, Vygantas, 0X, 16

Moein, Tania, 0H

Moss, David J., 0H

Munechika, Keiko, 0A

Nakamura, Yuya, 0O

Ng, Soon Hock, 0H

Nishihara, Atsuhiko, 0O

Nishio, Yukinobu, 0O

Okano, Masato, 0O

Ostendorf, Andreas, 0W

Padolskyte, Viktorija, 16

Pina-Hernandez, Carlos, 0A

Qu, Chuang, 0C

Reinhardt, Carsten, 0E

Rimšelis, Gabrielius, 17

Robinson, David, 1B

Sakirzanovas, Simas, 16

Sassolini, Simone, 0A

Savidis, Nickolaos, 0D

Schienbein, Ralf, 0E

Seewig, Jörg, 12

Seki, Daisuke, 0O

Sensen, Dominik, 0M

Shahal, Shir, 1A

Shin, Dooseub, 1G

Sim, Jee Hoon, 1F

Śmietana, Mateusz, 0F

Staliunas, Kestutis, 16

Stavrevski, Daniel, 0J

Sugden, Kate, 1B

von Freymann, Georg, 12

Wang, Lihui, 19

Wang, Wei-Chih, 0Q

Weidenfeller, Laura, 0E

Wenzel, Christian, 0M

Won, Yong Hyub, 1F, 1G

Wong, Edward, 0A

Wu, Wen-Jong, 0Q

Yamamoto, Kazuya, 0O

Youn, Jae Ryoun, 07

Zhu, Chen, 0C

Ziegler, Christiane, 12

Zyla, Gordon, 0W

Conference Committee

Symposium Chairs

  • Connie J. Chang-Hasnain, University of California, Berkeley (United States)

    Graham T. Reed, Optoelectronics Research Centre, University of Southampton (United Kingdom)

Symposium Co-chairs

  • Jean-Emmanuel Broquin, IMEP-LAHC (France)

    Shibin Jiang, AdValue Photonics, Inc. (United States)

Program Track Chairs

  • Ali Adibi, Georgia Institute of Technology (United States)

    Holger Becker, microfluidic ChipShop GmbH (Germany)

    Georg von Freymann, Technische Universität Kaiserslautern (Germany)

Conference Chairs

  • Georg von Freymann, Technische Universität Kaiserslautern (Germany)

    Winston V. Schoenfeld, CREOL, The College of Optics and Photonics, University of Central Florida (United States)

    Raymond C. Rumpf, The University of Texas at El Paso (United States)

Conference Program Committee

  • Cornelia Denz, Universität Münster (Germany)

    Ruth Houbertz, Multiphoton Optics GmbH (Germany)

    Saulius Juodkazis, Swinburne University of Technology (Australia)

    Stephen M. Kuebler, CREOL, The College of Optics and Photonics, University of Central Florida (United States)

    Akhlesh Lakhtakia, The Pennsylvania State University (United States)

    Mangirdas Malinauskas, Vilnius University (Lithuania)

    Robert R. McLeod, University of Colorado at Boulder (United States)

    Hernán R. Míguez, Institute of Materials Science of Seville (Spain)

    Dennis W. Prather, University of Delaware (United States)

    Aaron J. Pung, Clemson University (United States)

    John A. Rogers, University of Illinois at Urbana-Champaign (United States)

    Thomas J. Suleski, The University of North Carolina at Charlotte (United States)

    Michael Thiel, Nanoscribe GmbH (Germany)

    Sandra Wolff, Technische Universität Kaiserslautern (Germany)

Session Chairs

  • 1 Nanoplasmonics

    Georg von Freymann, Technische Universität Kaiserslautern (Germany)

  • 2 Fiber Optical Elements

    Stephen Jesse, Oak Ridge National Laboratory (United States)

  • 3 Printed Micro- and Nano-Optics

    Bastian E. Rapp, Karlsruher Institut für Technologie (Germany)

  • 4 Light Extraction and Guiding

    Agustin Mihi, Institut de Ciència de Materials de Barcelona (Spain)

  • 5 Large Area Fabrication

    Hans Zappe, Albert-Ludwigs-Universität Freiburg (Germany)

  • 6 Advanced Manufacturing using DMD or other SLM: Joint Session with Conferences 10544 and 10546

    Georg von Freymann, Technische Universität Kaiserslautern (Germany)

    Alfred Jacobsen, Visitech Engineering GmbH (Germany)

  • 7 3D Metrology: Joint Session with Conferences 10544 and 10546

    Alex Lyubarsky, Texas Instruments Inc. (United States)

    Roland Höfling, ViALUX GmbH (Germany)

  • 8 3D Laser Lithography I: Joint Session with Conferences 10523 and 10544

    Georg von Freymann, Technische Universität Kaiserslautern (Germany)

  • 9 3D Laser Lithography II: Joint Session with Conferences 10523 and 10544

    Frank Scheffold, Université de Fribourg (Switzerland)

  • 10 3D Laser Lithography III

    Christophe Moser, Ecole Polytechnique Fédérale de Lausanne (Switzerland)

  • 11 3D Laser Lithography IV

    Hong-Bo Sun, Jilin University (China)

© (2018) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 10544", Proc. SPIE 10544, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XI, 1054401 (26 June 2018); https://doi.org/10.1117/12.2322691
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