Extremely long life excimer laser technology for multi-patterning lithography

Yousuke Fujimaki; Makoto Tanaka; Takashi Itou; Hirotaka Miyamoto; Miwa Igarashi; Hiroaki Tsushima; Takeshi Asayama; Takahito Kumazaki; Akihiko Kurosu; Takeshi Ohta; Satoru Bushida; Hakaru Mizoguchi

doi:10.1117/12.2297341

20 March 2018 Extremely long life excimer laser technology for multi-patterning lithography

Yousuke Fujimaki, Makoto Tanaka, Takashi Itou, Hirotaka Miyamoto, Miwa Igarashi, Hiroaki Tsushima, Takeshi Asayama, Takahito Kumazaki, Akihiko Kurosu, Takeshi Ohta, Satoru Bushida, Hakaru Mizoguchi

Author Affiliations +

Proceedings Volume 10587, Optical Microlithography XXXI; 105871J (2018) https://doi.org/10.1117/12.2297341
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

Multi-patterning techniques with ArF immersion lithography is expected to continue as main solution for manufacturing IC chips. The reduction of laser downtime has great impact on the productivity of chipmakers. The laser downtime is closely related to the lifetime of consumable parts of the laser. Gigaphoton developed new laser modules, chamber and LNM (Line Narrowing Module) which have longer lifetime than current one. New chamber demonstrated 1.2 times longer lifetime than current chamber. New LNM demonstrated 1.8 times longer lifetime than current LNM. These new modules will help to reduce the downtime of the laser.

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Yousuke Fujimaki, Makoto Tanaka, Takashi Itou, Hirotaka Miyamoto, Miwa Igarashi, Hiroaki Tsushima, Takeshi Asayama, Takahito Kumazaki, Akihiko Kurosu, Takeshi Ohta, Satoru Bushida, and Hakaru Mizoguchi "Extremely long life excimer laser technology for multi-patterning lithography", Proc. SPIE 10587, Optical Microlithography XXXI, 105871J (20 March 2018); https://doi.org/10.1117/12.2297341

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