Antireflective coatings (ARC) are a necessary element of solar cells and infrared (IR) optical applications. Current state-of-the-art coatings consist of materials such as TiO2 and Si3N4 deposited on silicon via chemical vapor deposition (CVD). This method of coating is undesirable due to the costly, tedious, and time intensive nature of the process. Herein, we have developed a novel antireflective coating (ARC) that is facile in nature. Through the implementation of high sulfur content polymers, with ultrahigh refractive index, and near to mid infrared (IR) transparency, we have been able to demonstrate high-quality films via spin/dip coating. This polymer was produced via inverse vulcanization of elemental sulfur, a byproduct of petroleum refining, and the organic monomer 1,3-diisopropenylbenzene (DIB) to yield poly(sulfur-r-(1,3-diisopropenylbenzene)) (poly(s-r-DIB)). The reaction product (poly(s-r-DIB)) was taken up into solution and deposited directly onto a silicon substrate. To verify the performance of a quarter wave antireflection coating, the spectra of the coated silicon wafer was taken. In this we found we could create a high performance, single layer, antireflection coating. Due to the unique nature of the polymer (poly(s-r-DIB)) used in this system we were able to fine tune the thickness of the coating, and therefore the target wavelength in which desired performance could be observed. Further investigation of the system is underway, as the polymer’s index can be tuned to fit a variety of substrates, making this system ideal for a multitude of antireflective applications.
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