Open Access Paper
14 June 2019 Front Matter: Volume 10961
Abstract
This PDF file contains the front matter associated with SPIE Proceedings Volume 10961 including the Title Page, Copyright information, Table of Contents, Introduction, and Conference Committee listing.

The papers in this volume were part of the technical conference cited on the cover and title page. Papers were selected and subject to review by the editors and conference program committee. Some conference presentations may not be available for publication. Additional papers and presentation recordings may be available online in the SPIE Digital Library at SPIEDigitalLibrary.org.

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Please use the following format to cite material from these proceedings:

Author(s), “Title of Paper,” in Optical Microlithography XXXII, edited by Jongwook Kye, Soichi Owa, Proceedings of SPIE Vol. 10961 (SPIE, Bellingham, WA, 2019) Seven-digit Article CID Number.

ISSN: 0277-786X

ISSN: 1996-756X (electronic)

ISBN: 9781510625693

ISBN: 9781510625709 (electronic)

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Paper Numbering: Proceedings of SPIE follow an e-First publication model. A unique citation identifier (CID) number is assigned to each article at the time of publication. Utilization of CIDs allows articles to be fully citable as soon as they are published online, and connects the same identifier to all online and print versions of the publication. SPIE uses a seven-digit CID article numbering system structured as follows:

  • The first five digits correspond to the SPIE volume number.

  • The last two digits indicate publication order within the volume using a Base 36 numbering system employing both numerals and letters. These two-number sets start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B … 0Z, followed by 10-1Z, 20-2Z, etc. The CID Number appears on each page of the manuscript.

Authors

Numbers in the index correspond to the last two digits of the seven-digit citation identifier (CID) article numbering system used in Proceedings of SPIE. The first five digits reflect the volume number. Base 36 numbering is employed for the last two digits and indicates the order of articles within the volume. Numbers start with 00, 01, 02, 03, 04, 05, 06, 07, 08, 09, 0A, 0B…0Z, followed by 10-1Z, 20-2Z, etc.

Aarts, Igor, 0K

Bhattacharyya, Kaustuve, 09, 0K

Böcker, Paul, 0A

Brinkhof, Ralph, 0K

Cai, Jia-Syun, 07

Chang, Wei-Chun, 0B

Chao, Tzu-Chi, 0S

Chen, Ao, 0F

Chen, Chia-Huang, 0Z

Chen, Jun, 0F

Chen, Xi, 0F

Cheng, Shoumian, 0O

Chien, Sheng-Wei, 07

Choi, Jong-Cheol, 0A

de Ruiter, Chris, 0K

Eto, Shigeru, 0M

Fan, Congcong, 0Z

Feng, Mu, 0F

Foong, Yee Mei, 0F

Frank, Catherine, 0H

Gao, Pengzheng, 0P

Granik, Yuri, 0D

Gronlund, Keith, 0F

Guerrero, James, 0F

Hattori, Masakazu, 10

Hiltunen, Ronald, 0M

Hong, Ji-Suk, 05

Hu, Sophia, 0W, 10

Huang, Alex, 0Z

Huang, Jiun-Woei, 0T

Huisman, Simon, 0K

Ikeda, Junji, 0M

Ikezawa, Hironori, 0M

Jeong, Ik-Hyun, 0A

Jeong, Jaeseung, 05

Jiang, Hao, 0V

Jiang, Iris Hui-Ru, 0B

Ju, Jae-Wuk, 0A

Kanakutsu, Yutaka, 0M

Kang, Xiaohui, 0O

Karssemeijer, Leendertjan, 0A, 0K

Keij, Stefan, 0K

Kim, Hyun-Sok, 0A

Kim, Young-Sik, 0A

Koh, Kar Kit, 0F

Koizumi, Yukio, 0M

Kok, Haico, 0K

Kong, Yeong-Oh, 0A

Kubis, Michael, 0K

Kudo, Takehito, 10

Lai, Nelson, 0S

Lamb, James, 0H

Lambregts, Cees, 0A

Lang, Jun, 0F

Lee, Chien-Lin, 07

Lee, Honglak, 05

Lee, Jin-Seo, 0A

Lee, Kang-San, 0A

Lee, Kibok, 05

Lee, Sandra, 0F

Lee, Shawn, 0K

Lee, Sooryong, 05

Li, Angmar, 0O, 0Z

Li, Danying, 0Z

Li, Ming, 0O

Limmer, Tim, 0H

Lin, Lawrence, 0S

Lin, Ping-Hung, 0S

Liu, Shiyuan, 0V

Lu, Junwei, 0Z

Lyulina, Irina, 0K

Mai, Yung-Ching, 0S

Matsuyama, Tomoyuki, 0M

McNamara, Elliott, 0A

Megens, Henry, 0K

Menchtchikov, Boris, 0K

Mizoguchi, Hakaru, 10

Morgenfeld, Bradley, 0F

Mori, Ken-Ichiro, 0I

Mos, Evert, 0K

Motojima, Junichi, 0I

Mulkens, Jan, 0K

Oga, Toshihiro, 0W, 10

Oh, Nang-Lyeom, 0A

Omar, Hesham, 0F

Rahman, Rizvi, 0A

Rijpstra, Manouk, 0K

Sato, Futoshi, 0W

Schmitt-Weaver, Emil, 09, 0K

Shen, Yijiang, 0R

Shi, Weijie, 0P

Shi, Xuelong, 0O

Shi, Yating, 0V

Shi, Zhen, 0Z

Shiely, James P., 07, 0B

Shigenobu, Atsushi, 0I

Sim, Woojoo, 05

Simmons, Sean, 0H

Slotboom, Daan, 0K

Socha, Robert, 0K

Song, Ji-Hyun, 0A

St. John, Matt, 07

Stan, Edward, 0M

Su, Xiaojing, 0P

Suda, Hiromi, 0I

Takeuchi, Takenori, 0M

Tel, Wim, 0K

Ten Haaf, Gijs, 0K

Tsai, Kuen-Yu, 07

Tsao, Sheng-Tsung, 0Z

Tseng, Sean Shang-En, 0B

Wang, ChangAn, 0F

Wang, Shi-lu, 0Z

Wang, Yufeng, 0Z

Wei, Yayi, 0P

Xiao, Yanjun, 0O

Xu, David, 0Z

Yamazaki, Taku, 0W

Yang, Andy, 0Z

Yang, Dingdong, 05

Yang, Zhiyong, 0V

Yao, Leon, 0O

Ye, Xianggui, 0H

Yeh, Shin-Shing, 0S

Yu, Miao, 0A

Yuan, Wei, 0O

Zhang, Stella, 0Z

Zhang, Youping, 0Z

Zhao, Wenhao, 0O

Zhao, Yiqiong, 0F

Zhao, YuHang, 0O

Zhu, Jun, 0B

Zhu, Zhimin, 0H

Conference Committee

Symposium Chair

  • Will Conley, Cymer, an ASML Company (United States)

Symposium Co-Chair

  • Kafai Lai, IBM Thomas J. Watson Research Center (United States)

Conference Chair

  • Jongwook Kye, SAMSUNG Electronics Company, Ltd. (Korea, Republic of)

Conference Co-Chair

  • Soichi Owa, Nikon Corporation (Japan)

Conference Program Committee

  • Will Conley, Cymer, An ASML company (United States)

  • Carlos Fonseca, Tokyo Electron America, Inc. (United States)

  • Bernd Geh, Carl Zeiss SMT GmbH (United States)

  • Yuri Granik, Mentor Graphics Corporation (United States)

  • Harsha Grunes, Intel Corporation (United States)

  • Young Seog Kang, SAMSUNG Electronics Company, Ltd. (Korea, Republic of)

  • Sachiko Kobayashi, Toshiba Corporation (Japan)

  • Kafai Lai, IBM Corporation (United States)

  • Ken-Ichiro Mori, Canon Inc. (Japan)

  • John S. Petersen, IMEC (United States)

  • Mark C. Phillips, Intel Corporation (United States)

  • Daniel Sarlette, Infineon Technologies Dresden (Germany)

  • Xuelong Shi, Semiconductor Manufacturing International Corporation (China)

  • Bruce W. Smith, Rochester Institute of Technology (United States)

  • Kunal N. Taravade, Synopsys, Inc. (United States)

  • Geert Vandenberghe, IMEC (Belgium)

  • Reinhard Voelkel, SUSS MicroOptics SA (Switzerland)

  • Da Yang, Qualcomm Inc. (United States)

  • Uwe D. Zeitner, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)

Session Chairs

  • 1 Keynote Session and Late Breaking News

    Jongwook Kye, SAMSUNG Electronics Company, Ltd. (Korea, Republic of)

    Soichi Owa, Nikon Corporation (Japan)

  • 2 Machine Learning and Computational Lithography I

    Harsha Grunes, Intel Corporation (United States)

    Kunal N. Taravade, Synopsys, Inc. (United States)

  • 3 Machine Learning and Computational Lithography II

    John S. Petersen, IMEC (Belgium)

    Sachiko Kobayashi, Toshiba Corporation (Japan)

  • 4 Resist Modeling and Process Control

    Geert Vandenberghe, IMEC (Belgium)

    Daniel Sarlette, Infineon Technologies Dresden GmbH (Germany)

  • 5 Lithography Equipment

    Bernd Geh, Carl Zeiss SMT GmbH (United States)

    Reinhard Voelkel, SUSS MicroOptics SA (Switzerland)

© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
"Front Matter: Volume 10961", Proc. SPIE 10961, Optical Microlithography XXXII, 1096101 (14 June 2019); https://doi.org/10.1117/12.2533853
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KEYWORDS
Instrument modeling

Lithography

Machine learning

Computational lithography

Performance modeling

Current controlled current source

Lithium

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