High-order transversal mode suppression by facet loss in 970nm broad area laser

Junjie Kang; Weichuan Du; Yi Li; Kun Zhou; Yao Hu; Liang Zhang; Songxin Gao; Deyong Wu; Hao Tan; Zhao Wang; Chun Tang

doi:10.1117/12.2521937

12 March 2019 High-order transversal mode suppression by facet loss in 970nm broad area laser

Junjie Kang, Weichuan Du, Yi Li, Kun Zhou, Yao Hu, Liang Zhang, Songxin Gao, Deyong Wu, Hao Tan, Zhao Wang, Chun Tang

Proceedings Volume 11023, Fifth Symposium on Novel Optoelectronic Detection Technology and Application; 110234I (2019) https://doi.org/10.1117/12.2521937
Event: Fifth Symposium on Novel Optoelectronic Detection Technology and Application, 2018, Xi'an, China

Abstract

In this research, the transversal mode of 970 nm broad area laser diode based on a large optical cavity is studied. The vertical far-field patterns were measured to be dependent on the cavity caused facet loss. High-orders modes achieve lasing with higher facet loss while they can be completely suppressed by a low facet loss. The suppression of high-order modes was attributed to be an increase in the discrimination of differential quantum efficiency between high-order modes and the fundamental mode, which matches well with simulation. When the discrimination exceeds probable fluctuations, the high-order modes will be completely suppressed and lasing of single fundamental mode will achieve. According to our experiment results, the optimal resonance cavity length is about 6 mm in order to realize fundamental mode and simultaneously a high slope efficiency. As a consequence, high efficiency 970 nm broad area laser with slope efficiency over 1.07 W/A and full wavelength half maximum (FWHM) less than 2 nm@1A is demonstrated.

Citation Download Citation

Junjie Kang, Weichuan Du, Yi Li, Kun Zhou, Yao Hu, Liang Zhang, Songxin Gao, Deyong Wu, Hao Tan, Zhao Wang, and Chun Tang "High-order transversal mode suppression by facet loss in 970nm broad area laser", Proc. SPIE 11023, Fifth Symposium on Novel Optoelectronic Detection Technology and Application, 110234I (12 March 2019); https://doi.org/10.1117/12.2521937

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