Paper
8 July 2019 Investigation on damage process of indium tin oxide film induced by 1064nm quasi-CW laser
Liping Peng, Yuan'an Zhao, Xiaofeng Liu, Zhaoliang Cao, Jianda Shao, Ruijin Hong, Chunxian Tao, Dawei Zhang, Xi Wang
Author Affiliations +
Proceedings Volume 11063, Pacific Rim Laser Damage 2019: Optical Materials for High-Power Lasers; 1106302 (2019) https://doi.org/10.1117/12.2540821
Event: Pacific Rim Laser Damage 2019 and Thin Film Physics and Applications 2019, 2019, Qingdao, China
Abstract
Quasi-CW laser damage process of indium tin oxide (ITO) thin film was investigated. The ITO film with thickness of 300 nm was deposited on fused silica substrate by magnetron sputtering. Experiments were conducted on quasi-CW laser with wavelength of 1064 nm, and the test was executed in single shot test with radiation time of 60 s. The damage morphologies were observed via optical microscope and scanning electron microscope (SEM). The apparent damage started with change in color which the morphologies were visible to the naked eyes. With the power density higher than the laser induced damage threshold (LIDT), there were cracks in the center of the damage site. The temperature distribution of the ITO thin film was investigated based on the heat equation.
© (2019) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Liping Peng, Yuan'an Zhao, Xiaofeng Liu, Zhaoliang Cao, Jianda Shao, Ruijin Hong, Chunxian Tao, Dawei Zhang, and Xi Wang "Investigation on damage process of indium tin oxide film induced by 1064nm quasi-CW laser", Proc. SPIE 11063, Pacific Rim Laser Damage 2019: Optical Materials for High-Power Lasers, 1106302 (8 July 2019); https://doi.org/10.1117/12.2540821
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KEYWORDS
Laser induced damage

Indium

Laser damage threshold

Optical microscopes

Oxides

Tin

Scanning electron microscopy

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