Optimal analysis of trajectory parameters for the double-sided polishing in planetary motion mode

Chenchen Li D.D.S.; Chunyang Wang; Dasen Wa; Hongwei Shi

doi:10.1117/12.2541653

16 October 2019 Optimal analysis of trajectory parameters for the double-sided polishing in planetary motion mode

Chenchen Li D.D.S., Chunyang Wang, Dasen Wa, Hongwei Shi

Proceedings Volume 11205, Seventh International Conference on Optical and Photonic Engineering (icOPEN 2019); 112051T (2019) https://doi.org/10.1117/12.2541653
Event: Seventh International Conference on Optical and Photonic Engineering (icOPEN 2019), 2019, Phuket, Thailand

Abstract

Based on the processing mechanism of double-sided polishing machine and working mode, conducted intensive research, found that the motion state of the disc and pads can be simplified as a workpiece relative motion, and a complete mathematical model is built for the motion state of any point on the polishing disc. In view of the relationship among the workpiece’s motion characteristics, polishing process parameters and polishing effect, the computer is used to simulate the motion of the polishing disc relative to the workpiece in the state of steady motion. Taking the motion parameters as the control factor, by changing the ratio of different parameters, the different trajectory of the workpiece’s relative motion is obtained, and the regular pattern of the value of each factor on the motion trajectory distribution is explored. Finally, a set of parameters with the best grinding track uniformity and polishing effect were obtained through analysis and summary.

Citation Download Citation

Chenchen Li D.D.S., Chunyang Wang, Dasen Wa, and Hongwei Shi "Optimal analysis of trajectory parameters for the double-sided polishing in planetary motion mode", Proc. SPIE 11205, Seventh International Conference on Optical and Photonic Engineering (icOPEN 2019), 112051T (16 October 2019); https://doi.org/10.1117/12.2541653

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