Characterization Of Insulating Photorefractive Materials

Jean P. Zielinger; Mayer Tapiero; Jean G. Gies; Jean C. Launay

doi:10.1117/12.961419

22 December 1989 Characterization Of Insulating Photorefractive Materials

Jean P. Zielinger, Mayer Tapiero, Jean G. Gies, Jean C. Launay

Proceedings Volume 1127, Nonlinear Optical Materials II; (1989) https://doi.org/10.1117/12.961419
Event: 1989 International Congress on Optical Science and Engineering, 1989, Paris, France

Abstract

Widespread application of photorefractive materials depends to a great extent on the possibility of optimizing the extrinsic optical, electrical and photo-electrical properties which are indeed closely related to crystalline defects and impurities. This paper recalls how deep levels are involved in the figures of merit which characterize the performance of the photorefractive materials. Some fundamental difficulties for characterizing and controlling defects in insulators are reviewed. New opportunities are provided by the recent development of specific thermal and optical spectroscopic methods. The techniques are based on transient photoconductivity and differential optical measurements. The principles of the methods are described shortly. Typical results obtained with Bi12 Ge 020 are presented.

Citation Download Citation

Jean P. Zielinger, Mayer Tapiero, Jean G. Gies, and Jean C. Launay "Characterization Of Insulating Photorefractive Materials", Proc. SPIE 1127, Nonlinear Optical Materials II, (22 December 1989); https://doi.org/10.1117/12.961419

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