Customized Exposure Bandwidth For I-Line Resist Systems

John Schaller; Doreen Sa Vieira

doi:10.1117/12.961741

11 October 1989 Customized Exposure Bandwidth For I-Line Resist Systems

John Schaller, Doreen Sa Vieira

Proceedings Volume 1138, Optical Microlithography and Metrology for Microcircuit Fabrication; (1989) https://doi.org/10.1117/12.961741
Event: 1989 International Congress on Optical Science and Engineering, 1989, Paris, France

Abstract

In order to meet the resolution rquirements of future devices while maintaining cost effectiveness and high productivity, a low-cost machine modification was made. A newly designed bandpass filter was produced that optimizes the broadband illumination-based Micralign 500/600 projection aligner for use with i-line resist systems. The wavelength transmission of this new filter was selected to obtain the high-resolution characteristics of the UV-3 spectral range while providing the high throughput associated with the UV-4 spectral range. Performance data obtained under manufacturing conditions with a number of photoresists is presented. It shows that the practical considerations of resolution and depth of focus across the full field of the substrate were enhanced through the use of this bandpass filter. The inherently high throughput of projection systems in addition to one-micron resolution capability in a production process, make the Micralign 600 projection aligner a very cost-effective alternative to stepper systems in the selection of optical lithographic equipment.

Citation Download Citation

John Schaller and Doreen Sa Vieira "Customized Exposure Bandwidth For I-Line Resist Systems", Proc. SPIE 1138, Optical Microlithography and Metrology for Microcircuit Fabrication, (11 October 1989); https://doi.org/10.1117/12.961741

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KEYWORDS

Photoresist materials

Ultraviolet radiation

Bandpass filters

Photoresist developing

Image filtering

Absorption

Critical dimension metrology

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