Dual Ion Beam Deposition Of Diamond Films On Optical Elements

A . H. Deutchman; R. J. Partyka; J. C. Lewis

doi:10.1117/12.962069

15 January 1989 Dual Ion Beam Deposition Of Diamond Films On Optical Elements

A . H. Deutchman, R. J. Partyka, J. C. Lewis

Proceedings Volume 1146, Diamond Optics II; (1989) https://doi.org/10.1117/12.962069
Event: 33rd Annual Technical Symposium, 1989, San Diego, United States

Abstract

Diamond film deposition processes are of great interest because of their potential use for the formation of both protective as well as anti-reflective coatings on the surfaces of optical elements. Conventional plasma-assisted chemical vapor deposition diamond coating processes are not ideal for use on optical components because of the high processing temperatures required, and difficulties faced in nucleating films on most optical substrate materials. A unique dual ion beam deposition technique has been developed which now makes possible deposition of diamond films on a wide variety of optical elements. The new DIOND process operates at temperatures below 150 aegrees Farenheit, and has been used to nucleate and grow both diamondlike carbon and diamond films on a wide variety of optical :taterials including borosilicate glass, quartz glass, plastic, ZnS, ZnSe, Si, and Ge.

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A . H. Deutchman, R. J. Partyka, and J. C. Lewis "Dual Ion Beam Deposition Of Diamond Films On Optical Elements", Proc. SPIE 1146, Diamond Optics II, (15 January 1989); https://doi.org/10.1117/12.962069

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