1Brookhaven National Lab. (United States) 2Stony Brook Univ. (United States) 3National Institute of Standards and Technology (United States) 4The Univ. of Texas at Dallas (United States)
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We have developed an organic-inorganic hybrid resist platform featuring versatile ex-situ control of its performance by incorporating inorganic elements using vapor-phase infiltration (VPI) into standard organic resists. With poly(methyl methacrylate) (PMMA)-AlOx hybrid as a model composition we unveiled controllability of the critical exposure dose, contrast (as high as ~30), and etch resistance; estimated Si etch selectivity over ~300, demonstrating high aspect ratio ~17 with ~30 nm resolution Si fin-structures. Building upon the demonstration of PMMA-AlOx hybrid resist, we expanded our material portfolio to a high sensitivity resist and other inorganic moieties. We present preliminary results obtained from the extreme ultraviolet (EUV) lithography dose tests conducted on corresponding infiltrated hybrids and optimization of infiltration with the help of transmission electron microscopy (TEM).
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Nikhil Tiwale, Ashwanth Subramanian, Guillaume Freychet, Eliot Gann, Kim Kisslinger, Ming Lu, Aaron Stein, Jiyoung Kim, Chang-Yong Nam, "Hybrid resist synthesis by ex-situ vapor-phase infiltration of metal oxides into conventional organic resists," Proc. SPIE 11612, Advances in Patterning Materials and Processes XXXVIII, 116120A (22 February 2021); https://doi.org/10.1117/12.2583908