Presentation + Paper
5 March 2021 Enhanced self-aligned structure for improved lateral brightness in 940 nm high-power broad-area diode lasers
M. Elattar, O. Brox, P. Della Casa, A. Maaßdorf, D. Martin, H. Wenzel, A. Knigge, P. Crump
Author Affiliations +
Abstract
We present 940nm GaAs-based high-power broad-area diode lasers that use an enhanced self-aligned lateral structure "eSAS", implemented within an extreme-triple-asymmetric vertical structure with a thin p-side. In this structure, two-step epitaxial growth with intermediate selective etching is used to introduce current-blocking structures consisting of n-doped GaAs and InGaP layers outside the laser stripe, whose location, thicknesses and doping concentrations are precisely defined. These blocking structures confine current to the device center, thus reducing carrier losses in the edges and limiting the detrimental effects of lateral current spreading and carrier accumulation on beam quality, without compromising conversion efficiency, output power or polarization purity. We present results of eSAS single-emitters as well as bars with multiple emitters, in comparison to gain-guided reference devices. In addition, we demonstrate optimized blocking structures with improved current blocking, which are crucial for the realization of the eSAS structure.
Conference Presentation
© (2021) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
M. Elattar, O. Brox, P. Della Casa, A. Maaßdorf, D. Martin, H. Wenzel, A. Knigge, and P. Crump "Enhanced self-aligned structure for improved lateral brightness in 940 nm high-power broad-area diode lasers", Proc. SPIE 11705, Novel In-Plane Semiconductor Lasers XX, 117050N (5 March 2021); https://doi.org/10.1117/12.2578190
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KEYWORDS
Semiconductor lasers

High power lasers

Polarization

Doping

Etching

Ion implantation

Laser applications

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