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1.INTRODUCTIONELFIS [1-3] was the first image sensor that had a unique combination of properties, being true HDR (high dynamic range), true global shutter, of both types integrate-while-read (IWR) and integrate-then-read (ITR), backside illumination and design for TID hardness. It had a resolution 1920x1080 pixels on a 15μm pitch. In this paper we describe its successor, which has the same pixel size and topology and the same key features as HDR, BSI, global shutter and TID hardness. It features following improvements
We will at the moment of the conference have completed the design. A detailed specification prediction can be given, yet there will be no measured performance data. 2.FLOORPLAN AND SPECIFICATIONSThe ELFIS2 is a fully “stitchable” version of the ELFIS11-3. The unit block is as large as 1k x 0.5k pixels. The baseline device that will be manufactured measures 2k x 2k pixels. Specifications per default apply to this size. → Figure 1 is top level floorplan of the ELFIS2, represented as “stitch blocks”. Key part of the array are lithographically printed using the stitch unit blocks numbered “A” to “I”. Pixels are arranged per 1024x512 pixels of an “E” block. Row drivers providing the controls for pixel switches are present in D and F blocks. The B block contains column biasing and pixel supply connections. The H block contains the X-multiplexing and the 8-channel readout structure. A, C, G, I are the corner blocks containing register upload and other housekeeping parts. Specifications shortlist
3.PIXEL DESIGNThe ELFIS2 pixel is a direct successor of the ELFIS pixel 3 . Its schematic circuit is shown in Figure 2. 4.HDR OPERATIONThe high dynamic range is obtained by converting the photocharge of a given integration time to a voltage (signal) twice. The first charge to voltage conversion is on a small capacitance, resulting in a “high gain” (HG) signal S1, the second conversion is on a large capacitance leading to low gain (LG) signal S2. Effectively one has two QFW.
The low QFw uses the “classic” Storage Node (SN) of the Global Shutter (GS) CMOS technology. The high QFw uses overflow capacitors to store an amount of charge that exceeds the charge storage of the SN. In order to realize IWR (integrate while read) two sets of high QFW capacitors are used, on which the charge is stored for odd and even frames. During the integration time photo-electrons are accumulated in the pinned photodiode (PPD) (Figure 4). If the amount of electrons in the PPD exceeds ~10000, these overflow over TG3 into the capacitor node (CN), for later use. There are two CNs with a total capacity for 320000 electrons. If the total charge exceeds even this 320000 electrons, it overflows to the anti-blooming drain. At the end of the integration time, the (maximally) 10000 electrons still present in the PPD are transferred by transfer gate TG1 to the storage node (SN). Just before the moment of readout, there are thus
The total integrated photocharge is the sum of those two. At the moment of readout (Figure 5) TG2 is toggled and transfers the photocharge charge from SN to the floating diffusion (FD), where is it read out using correlated double sampling (CDS), yielding a signal “S1”. Immediately afterwards the switch “Merge” is closed, shunting the FD and the CN (C1, C2). The sum of both charge packets is on FD, and is read out, yielding a signal “S2” At each illumination level both low QFW and high QFW signals are measured. The “HDR” signal is a combination of these. The combined dynamic range is defined as {max QFW} / {min Qnoise} The predicted dynamic range is then:
HDR interpolation algorithm The ELFIS2 outputs per pixel two signals, S1 and S2. As one normally needs to express the photoresponse of a pixel as a single numeric value, S1 and S2 must be off-chip combined. On our set-up we use the following algorithm to combine the signals HG (S1) and LG (S2) into a single HDR value. In a first step, both the S1 and S2 signals are separately FPN and PRNU corrected. Then the S1 and S2 signals are scaled with a factor so that both signals coincide in the valid range of S1. Then for each pixel we consider the value of S1: If the HG “S1” signal is above 75% of S1 saturation → take the LG signal S2 When the HG signal is below 50% of S1 saturation → take the HG value S1 Between 50% and 75%: → apply a weighted interpolation between S1 (HG) and S2 (LG) as shown in Figure 7 5.CHARGE DOMAIN BINNINGIn the context of image sensors, binning is the readout of the information of the image sensor, whereby the signals of a group of pixels are summed or averaged and read out as a single “binned” signal. There are many different methods to realize binning, with following coarse classification:
The advantages of binning are
The ELFIS2 uses a novel way to do charge domain binning in regular CMOS pixels. One operates or biases the pixels in the pixel array differently. Certain pixels are operated normally to have “charge collecting photodiodes” or “charge collecting junctions”, others are operated so that they are not or less charge collecting. In order to be not or less collecting, the non-collecting junctions must be at an intermediate potential, higher than the junction being forward biased towards the substrate, yet lower than the bias of the collecting junctions. This is realized by letting the non-collecting pixels or their photodiode “float” (not being forced at a potential) or explicitly biased at a suitable lower potential. It is beneficial that the depletion layer of the collecting junctions extends widely and overlaps between the neighboring junctions. Widely extending depletion layers imply the use of high resistivity material. However, it is possible to reach the effect as well in normal resistivity material. Having a thick high resistivity material as compared to the pixels size is thus beneficial. With a pixel size (pixel pitch) of 15μm, the layer thickness must be in the order of 10μm or more. The method works best in backside illuminated configuration, yet also in frontside illuminated image sensors the method can work. In the example of Figure 8 three neighboring 4T pixels are shown schematically. The two outer pixels are operated to be charge collecting, the middle pixel is operated to be not collecting. The photodiode is made floating by permanently turning off the transfer gate TG. As the photodiode has no path to drain the photocurrent, its potential will drop to the level that the PPD-substrate diode becomes forwards biased, or that the TG leaks. 6.READOUT CHAINFigure 9 show the analog signal chain from pixels to bondpad. The output of in-pixel source follower is buffered or amplified by a programmable gain amplifier. The reset and signal values of the pixel are sampled separately to execute correlated double sampling (CDS) down the chain. The sampled voltages are buffered onto the video bus through video buffers. The single ended to differential (S2D) converter serves to convert the native pseudo differential signal to fully differential signals. The output of all the single ended to differential converters are multiplexed at pixel output frequency and buffered to the output. The readout chain contains various options to program gain, to reduce the read noise, and to perform fixed pattern noise cancellation, not shown for simplification. The overall timing diagram of the sensor (Figure 10) can be grouped into 2 operation regions. These operations are performed on the whole sensor. It includes transfer of charges from PPD to SN. Additionally, any remaining charges on PPD are fully transferred onto the low gain capacitor by toggling the transfer gate that was biased at mid-level in the previous readout cycle. PPD and the low gain capacitor (readout from previous readout cycle) are reset before the readout begins. The readout is performed per row. A pixel row is addressed for readout. The reset level of FD, high gain signal level after the charge transfer and low gain signal level after the merge operation are all sampled onto the S&H capacitor. The high gain and low gain signals are sampled sequentially and readout out in the same order. CDS is executed only on the high gain signal, for the low gain signal a DC reference is used. ACKNOWLEDGMENTSThe ELFIS2 sensor is developed as part of ESA contract 40001332952. We acknowledge the fruitful collaborations with the ESA/ESTEC staff (Noordwijk, NL), Airbus Defense & Space (Toulouse, FR), LFoundry S.r.l. (Avezzano, IT). REFERENCESKalgi A.K., Wang W., Dierickx, B., Van Aken D., Wu K., Klekachev A., Ruttens G., Minoglou K., Riedlberger F., Di Nicolantonio G., Palumbi F., Pelamatti A.,
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