Multi-beam mask writer MBM-2000

Hiroshi Matsumoto; Keisuke Yamaguchi; Hayato Kimura; Noriaki Nakayamada

doi:10.1117/12.2600904

1 October 2021 Multi-beam mask writer MBM-2000

Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Noriaki Nakayamada

Proceedings Volume 11855, Photomask Technology 2021; 118550W (2021) https://doi.org/10.1117/12.2600904
Event: SPIE Photomask Technology + EUV Lithography, 2021, Online Only

Abstract

The multi-beam mask writer MBM-2000 is released for the 3 nm technology node. It is designed to expose EUV blanks and leading edge photomasks at high throughput with beamlets of total current 1.6 uA. The curve data format supported by MBF 2.0 enables full-mask writing of curvilinear patterns by reducing data volume and computation cost of rasterizing. To maximize the performance of multi-beam writing, MBM-2000 is equipped with pixel level dose correction (PLDC) which improves pattern fidelity and patterning resolution. In this paper, we have reported and discussed the writing results of MBM-2000.

Conference Presentation

Citation Download Citation

Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, and Noriaki Nakayamada "Multi-beam mask writer MBM-2000", Proc. SPIE 11855, Photomask Technology 2021, 118550W (1 October 2021); https://doi.org/10.1117/12.2600904

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available