Presentation + Paper
20 May 2022 Maskless lithography with holographic feedback for the fabrication of optical elements
Tolga Gürcan, Muhammed Fatih Toy
Author Affiliations +
Abstract
Photolithography has become a powerful tool in the fabrication of micro-optical elements following the advancements in grayscale approaches. However, hitting tight design tolerance goals require precise control of all parameters such as temperature, resist nonlinearity or preventing vignetting. In this work we took an alternative route to these problems by combining maskless lithography with digital holography. Addition of digital holography enables the use of feedback by measuring the quantitative phase of specimen near real time and in situ nondestructively. After each near UV exposure, phase retardation map of exposed photopolymer is measured with digital holography part of the system. Any deviation from target phase is corrected by changing the pattern displayed on the mask. We showed that the proposed method reduces the standard deviation of resulting phase compared to traditional one-shot grayscale lithography. It also does not require any precalibration of photoresist and relaxes the constraints for uniform UV illumination in sample plane.
Conference Presentation
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tolga Gürcan and Muhammed Fatih Toy "Maskless lithography with holographic feedback for the fabrication of optical elements", Proc. SPIE 12135, 3D Printed Optics and Additive Photonic Manufacturing III, 1213508 (20 May 2022); https://doi.org/10.1117/12.2621546
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KEYWORDS
Digital holography

Grayscale lithography

Holography

Phase measurement

Maskless lithography

Spatial light modulators

Optical components

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