Silicon nitride thin film for optofluidic sensor application

Ahmed Kreta; Amira Ahmed; Sara Mohamed; Mohamed A. Swillam

doi:10.1117/12.2665759

31 May 2023 Silicon nitride thin film for optofluidic sensor application

Ahmed Kreta, Amira Ahmed, Sara Mohamed, Mohamed A. Swillam

Proceedings Volume 12572, Optical Sensors 2023; 125721J (2023) https://doi.org/10.1117/12.2665759
Event: SPIE Optics + Optoelectronics, 2023, Prague, Czech Republic

Abstract

Microfluidic devices have the capability to assist in the development of basic miniaturized devices. Optical measurements are powerful in the application of sensors. Optofluidic, or the integration of optics with microfluidics, provides an appealing framework for the implementation of optical devices with a wide range of characteristics and functions. We provide a manufacturing approach for optofluidic devices by integrating a microfluidic channel made of PDMS with silicon nitride substrate to enable optical measurements. The SiN thin film was prepared by means of plasma-enhanced chemical vapour deposition (PECVD), such that SiN was deposited on a Si wafer using only SiH4 and N2 precursors to reduce the hydrogen content. The SiN thin-film thickness is in the range of 300 nm to 350 nm. A microfluidic channel was prepared by casting PDMS on a fabricated mold patterned on a commercial FR4 board. The device was composed by integrating the SiN substrate with the microfluidic channel and tested for optical measurements.

Citation Download Citation

Ahmed Kreta, Amira Ahmed, Sara Mohamed, and Mohamed A. Swillam "Silicon nitride thin film for optofluidic sensor application", Proc. SPIE 12572, Optical Sensors 2023, 125721J (31 May 2023); https://doi.org/10.1117/12.2665759

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