Phase-shifting interferometry measure stress of HfO2/SiO2 anti-reflector multi-layer deposited with ion-assisted deposition

Hao-Wei Kao; Hsi-Chao Chen; Sheng-Bin Chen; Tan-Fu Liu; Bo-Huei Liao; Sheng-De Wong; Yang-Chi Wang

doi:10.1117/12.3005544

20 September 2023 Phase-shifting interferometry measure stress of HfO₂/SiO₂ anti-reflector multi-layer deposited with ion-assisted deposition

Hao-Wei Kao, Hsi-Chao Chen, Sheng-Bin Chen, Tan-Fu Liu, Bo-Huei Liao, Sheng-De Wong, Yang-Chi Wang

Author Affiliations +

Proceedings Volume 12607, Optical Technology and Measurement for Industrial Applications Conference; 126070I (2023) https://doi.org/10.1117/12.3005544
Event: Optics and Photonics International Congress, 2023, Yokohama, Japan

Abstract

The research proposal was used hafnium dioxide (HfO₂) and silicon dioxide (SiO₂) as the high and low refractive index for the multilayer anti-reflection (AR) films were deposited on a flexible polyethylene terephthalate (PET) by electron-beam evaporator with ion-beam assisted deposition (IAD). The optical and stress properties of these multilayer (HfO₂/SiO₂)² films were investigated. A homemade phase-shifting shadow moiré interferometer was used the automatic measurement system to catch the interferograms and calculated the residual stress of flexible electronics. The experimental results show the optimal oxygen flow of HfO₂ and SiO₂ were 15 and 25 sccm, respectively, for the multilayer anti-reflection coating (AR coating) with electron-beam evaporator. The 1st and 2nd layers have light thickness resulted from low ion-assisted energy, so the stress generation is very low. Since the compressive stress is not generated until the 3rd and 4th layers. However, the stress is reduced after high and low refractive index stacking, and the final residual stress of (HfO₂/SiO₂)² multilayers on the PET is -473.37 MPa.

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Hao-Wei Kao, Hsi-Chao Chen, Sheng-Bin Chen, Tan-Fu Liu, Bo-Huei Liao, Sheng-De Wong, and Yang-Chi Wang "Phase-shifting interferometry measure stress of HfO₂/SiO₂ anti-reflector multi-layer deposited with ion-assisted deposition", Proc. SPIE 12607, Optical Technology and Measurement for Industrial Applications Conference, 126070I (20 September 2023); https://doi.org/10.1117/12.3005544

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KEYWORDS

Coating stress

Refractive index

Multilayers

Bending stress

Shadows

Film thickness

Oxygen

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