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IntroductionThis year the conference “Optical measurement systems for industrial inspection XIII” will again contribute as a substantial part to the biannual Munich SPIE symposium “Optical Metrology” and the “LASER World of Photonics Congress”. The meeting with its long tradition commits itself to encourage dialogue between scientists from academia and industry aiming at knowledge exchange and recognizing new trends, applications and developments in optical metrology. We are happy that this year’s conference, which is the thirteenth in a still running series, will take place as an international in-person meeting once again, and the number of more than 120 submitted contributions is at the same level as before the pandemic. Again, optical metrology applications of all relevant fields of industrial production are addressed, ranging from high-precision and resolution enhancement techniques to industrial in-process and in-situ measurements. Obviously, the acquisition of information based on reliable measurement data is still an essential prerequisite to stimulate sustainable progress in industrial manufacturing. In addition, even new trends such as artificial intelligence and deep learning approaches are driven by the increasing availability of data and are thus pushing the broad use of optical measurement systems. Hence, recent developments support optical metrology to expand its position as a dynamic field of technology enabling to monitor, control, and improve industrial products and processes. This year’s conference includes two joint sessions linking the industrial inspection conferences and the conference 12619, Modeling Aspects in Optical Metrology. These sessions are dedicated to modelling and characterisation in quantitative microscopy and emphasize the importance of microscopy in optical metrology. They start with an invited paper on the topographic lateral resolution of interferometers by Peter de Groot. Most contributions are related to the European project TracOptic, (Traceable industrial 3D roughness and dimensional measurement using optical 3D microscopy and optical distance sensors) and the German project SiM4diM (Simulation and machine learning for high-precision dimensional microscopy). Further, a special session named “Metrology for autonomous vehicles”, starting with an invited talk by Christoph Werner on a LiDAR system for low visibility conditions, promises detailed insight in this rapidly growing field, where optical metrology plays a major role. Last but not least some invited keynote presentations strengthen the importance of the conference. These include talks by Guohai Situ on the use of deep learning for computational optical imaging, by Arash Darafsheh on micro-sphere assisted microscopy and by Eriko Watanabe on imaging through scattering media. Finally, we would like to express our sincere gratitude to the members of the program committee for their support of the conference. Additionally, many thanks are due to the SPIE staff, namely Alex Pulchart Rusova and Karin Burger, for their great, professional and cooperative work during the conference organization and the preparation of this proceedings volume. In sum we are optimistic that the outstanding level and quality of submissions will support the success of the conference. Thus, we would also like to thank all authors, who gave added value to our community by contributing to this proceedings volume. We hope that you will enjoy it. Peter Lehmann Wolfgang Osten Armando Albertazzi |
