Presentation + Paper
10 August 2023 Comparative analysis of grating reconstruction: deep learning versus Levenberg-Marquardt methods
L. Fu, X. Wang, K. Frenner, S. Reichelt
Author Affiliations +
Abstract
Model-based optical scatterometry is a widely utilized non-destructive measuring technique in semiconductor manufacturing for retrieving features on wafers. It offers an attractive solution for quality control and process monitoring. However, the increasing complexity of 3D nanoscale device structures presents significant challenges for optical scatterometry. To address these challenges, it is crucial to integrate different methods and create a hybrid metrology approach that could encompass measurements, modeling, and data analysis techniques. To tackle this objective, we explore in this study two alternative approaches for parameter reconstruction, distinct from the conventional library search method. The first approach utilizes a neural network based on a Resnet architecture, while the second approach employs the Levenberg-Marquardt algorithm, a nonlinear least square fitting technique. By performing a comparative analysis of the two methods, we propose a strategy to combine them for accurate and efficient parameter reconstructions.
Conference Presentation
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
L. Fu, X. Wang, K. Frenner, and S. Reichelt "Comparative analysis of grating reconstruction: deep learning versus Levenberg-Marquardt methods", Proc. SPIE 12619, Modeling Aspects in Optical Metrology IX, 1261907 (10 August 2023); https://doi.org/10.1117/12.2688328
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KEYWORDS
Reconstruction algorithms

Mueller matrices

Neural networks

Scatterometry

Optical gratings

Deep learning

Polarization

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