Ion beams for photomask repair and fabrication

Donald Osias; Donald Shernock

doi:10.1117/12.3011872

11 October 2023 Ion beams for photomask repair and fabrication

Donald Osias, Donald Shernock

Proceedings Volume 12808, Bay Area Chrome Users Society Symposium 1984; 1280806 (2023) https://doi.org/10.1117/12.3011872
Event: 4th Annual BACUS Symposium, 1984, Santa Clara, CA, United States

Abstract

High-energy (approximately 15 keV) ion beams have been successfully used to convert photoresist into a hard, well-adhered, optically-dense vitreous carbon film. The resulting material is an excellent hard mask fabrication or repair material which has scratch resistance and UV optical density comparable to that of chrome, and having chemical resistance and substrate adhesion superior to that of chrome. High-quality hard photomasks have been fabricated by ion-implanting resists directly on glass. Clear defects in standard chrome hard masks have been repaired by ion-bombarding reverse-tone positive photoresist patches. The resultant repairs are as durable as chrome and are indistinguishable from the chrome when printed with 405 or 460 nm light. Thin layers of electron-beam sensitive resists such COP and PBS have also been successfully hardened by ion-bombardment. To take advantage of this phenomenon a simple and low-cost ion accelerator has been designed for ion hardening of resist. This new accelerator makes the application of the techniques practical and cost-effective for photomask processing.

Citation Download Citation

Donald Osias and Donald Shernock "Ion beams for photomask repair and fabrication", Proc. SPIE 12808, Bay Area Chrome Users Society Symposium 1984, 1280806 (11 October 2023); https://doi.org/10.1117/12.3011872

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