Non-disruptive Bessel-beam array generation for high-throughput shadow mask laser patterning

Hyungsik Kim; Konstantin Mishchik; Woohyun Jung; Sunggyu Park; Kyunghan Yoo; Jekil Ryu; SeungJoo Lee; Seongho Jeong; Cheollae Roh

doi:10.1117/12.3003603

12 March 2024 Non-disruptive Bessel-beam array generation for high-throughput shadow mask laser patterning

Hyungsik Kim, Konstantin Mishchik, Woohyun Jung, Sunggyu Park, Kyunghan Yoo, Jekil Ryu, SeungJoo Lee, Seongho Jeong, Cheollae Roh

Author Affiliations +

Proceedings Volume 12872, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXIX; 1287202 (2024) https://doi.org/10.1117/12.3003603
Event: SPIE LASE, 2024, San Francisco, California, United States

Abstract

Generation of multiple parallel non-diffractive beams without any disruption of each beam is a challenging task. Here, we report the approach of spatial-spectral modulation for non-disruptive generation of Bessel beam array. Such modulation is realized with a simple beam splitter placed in a Fourier plane of the initial beam. The various designs of the beam-splitter phase mask allow to generate an array of the Bessel beams with various shapes and controlled intensity distribution without mutual interference of each beam. As such, this array formation can enhance quality of glass cutting and increase the throughput of micro-patterning of glass-fine mask required for a new generation high-resolution OLED display.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Hyungsik Kim, Konstantin Mishchik, Woohyun Jung, Sunggyu Park, Kyunghan Yoo, Jekil Ryu, SeungJoo Lee, Seongho Jeong, and Cheollae Roh "Non-disruptive Bessel-beam array generation for high-throughput shadow mask laser patterning", Proc. SPIE 12872, Laser Applications in Microelectronic and Optoelectronic Manufacturing (LAMOM) XXIX, 1287202 (12 March 2024); https://doi.org/10.1117/12.3003603

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