Combining nano-scale imprint lithography and reactive ion etching to fabricate high-quality surface relief gratings

Micha Haase; Nils Dittmar; Andrea Kneidinger; Patrick Schuster; Frederik Bachhuber; Christian Helke; Danny Reuter

doi:10.1117/12.3002254

13 March 2024 Combining nano-scale imprint lithography and reactive ion etching to fabricate high-quality surface relief gratings

Micha Haase, Nils Dittmar, Andrea Kneidinger, Patrick Schuster, Frederik Bachhuber, Christian Helke, Danny Reuter

Author Affiliations +

Proceedings Volume 12898, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII; 128980L (2024) https://doi.org/10.1117/12.3002254
Event: SPIE OPTO, 2024, San Francisco, California, United States

Abstract

In this study, we present a novel approach combining nano-scale imprint lithography (NIL) and reactive ion etching (RIE) to fabricate high-quality surface relief gratings (SRGs). This study provides valuable insights into the challenges and optimizations in fabricating SRGs from TiO₂ layers using the combination of NIL and RIE. The work was performed with SCHOTT RealView® substrates coated with a 100 nm TiO₂ layer and a NIL mask with pattern widths of 200 nm and a pitch of 400 nm. The substrates were processed using the SmartNIL® method to prepare the NIL mask. The advantage of removing the residual layer before the actual structuring of the TiO₂ using argon plasma was demonstrated in our research. This led to a significant increase in the selectivity between TiO₂ and the NIL resist UV/OA R18. Through the employment of a two-step etching process, which involved the removal of the residual layer with argon plasma and the use of a BCl₃-based reactive process with high ion energy, TiO₂ structures with a height of 100 nm and a sidewall angle of 75° were successfully created. An effective selectivity of 0.84 was achieved for this two-step process.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Micha Haase, Nils Dittmar, Andrea Kneidinger, Patrick Schuster, Frederik Bachhuber, Christian Helke, and Danny Reuter "Combining nano-scale imprint lithography and reactive ion etching to fabricate high-quality surface relief gratings", Proc. SPIE 12898, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII, 128980L (13 March 2024); https://doi.org/10.1117/12.3002254

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