Paper
18 December 2023 Effects of mid-spatial frequency errors of optical surface on the penumbra width of photolithography relay lens
Jiahong Liu, Fang Zhang, Huijie Huang
Author Affiliations +
Proceedings Volume 12964, AOPC 2023: Optical Design and Manufacturing ; 129640N (2023) https://doi.org/10.1117/12.3008049
Event: Applied Optics and Photonics China 2023 (AOPC2023), 2023, Beijing, China
Abstract
High-precision lens element polishing process can cause the mid-spatial frequency surface error and thus affect the image quality. In order to investigate the influence of the mid-spatial frequency errors on the performance of the photolithography illumination system, a partially coherent optical model is used. The mid-spatial frequency error generated by the processing is relatively complex and can be simplified to a random function convolved with a structured mid-spatial frequency error. This paper selects the mid-spatial frequency distribution from an actual processed aspheric, and adopts the penumbra width of the relay lens as an evaluation target. The analysis results shown that the surface closest to the pupil plane might be most impact factor.
(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Jiahong Liu, Fang Zhang, and Huijie Huang "Effects of mid-spatial frequency errors of optical surface on the penumbra width of photolithography relay lens", Proc. SPIE 12964, AOPC 2023: Optical Design and Manufacturing , 129640N (18 December 2023); https://doi.org/10.1117/12.3008049
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KEYWORDS
Shadows

Optical surfaces

Error analysis

Relays

Optical lithography

Imaging systems

Image processing

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