Decoupling and disturbance rejection for leveling and focusing stage of lithographic equipment

Cheng Xue; Lin Gu; Qinghua Zhou; Yong Yang

doi:10.1117/12.3008489

29 December 2023 Decoupling and disturbance rejection for leveling and focusing stage of lithographic equipment

Cheng Xue, Lin Gu, Qinghua Zhou, Yong Yang

Proceedings Volume 12976, Eighth Asia Pacific Conference on Optics Manufacture and Third International Forum of Young Scientists on Advanced Optical Manufacturing (APCOM and YSAOM 2023); 129760U (2023) https://doi.org/10.1117/12.3008489
Event: 8th Asia Pacific Conference on Optics Manufacture & 3rd International Forum of Young Scientists on Advanced Optical Manufacturing, 2023, Shenzhen, China

Abstract

As a key subsystem of step and scan projection lithographic machines, the three-degree-of-freedom leveling and focusing stage always fails to achieve ultra-precision motion because its control system cannot achieve complete decoupling. Taking up this challenge, in this paper we propose a complete decoupling control method containing static decoupling and dynamic decoupling based on nonlinear active disturbance rejection control (ADRC) for the stage. First, by setting virtual control variables, the three-input three-output coupled system is transformed into three nearly independent single-input singleoutput systems. Then, the nonlinear ADRC is utilized to solve the residual coupling caused by coupling model inaccuracies. Finally, the simulation results show that the proposed control method has better robustness and disturbance rejection ability than feedforward compensation PID control and linear ADRC.

(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Cheng Xue, Lin Gu, Qinghua Zhou, and Yong Yang "Decoupling and disturbance rejection for leveling and focusing stage of lithographic equipment", Proc. SPIE 12976, Eighth Asia Pacific Conference on Optics Manufacture and Third International Forum of Young Scientists on Advanced Optical Manufacturing (APCOM and YSAOM 2023), 129760U (29 December 2023); https://doi.org/10.1117/12.3008489

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