Deposition methods and process techniques for the fabrication of electrochromic all-solid-state devices

Klaus Muecke; Frank Boehm; Thomas Gambke; Clemens R. Ottermann; Klaus Bange

doi:10.1117/12.22410

1 December 1990 Deposition methods and process techniques for the fabrication of electrochromic all-solid-state devices

Klaus Muecke, Frank Boehm, Thomas Gambke, Clemens R. Ottermann, Klaus Bange

Proceedings Volume 1323, Optical Thin Films III: New Developments; (1990) https://doi.org/10.1117/12.22410
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

The electrochromic behavior of all solid state devices (ASSDs) is connected with deposition methods and process techniques for production. Cathodically and anodically colored electrochromic materials and solid state electrolytes are compared and the influence of films prepared by reactive evaporation and reactive sputtering is described. In addition, the general electrochemical behavior of films is discussed, whiéh are produced by chemical vapor deposition, dip coating, electrodeposition and anodic oxidation.

Citation Download Citation

Klaus Muecke, Frank Boehm, Thomas Gambke, Clemens R. Ottermann, and Klaus Bange "Deposition methods and process techniques for the fabrication of electrochromic all-solid-state devices", Proc. SPIE 1323, Optical Thin Films III: New Developments, (1 December 1990); https://doi.org/10.1117/12.22410

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