New Zeiss interferometer

Michael F. Kuechel

doi:10.1117/12.51116

1 January 1991 New Zeiss interferometer

Michael F. Kuechel

Proceedings Volume 1332, Optical Testing and Metrology III: Recent Advances in Industrial Optical Inspection; (1991) https://doi.org/10.1117/12.51116
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

A new Zeiss interferometer, the Direct 100, is described. This interferometer contains important improvements that are especially applicable to measurements in the presence of vibrations, measurements requiring the highest spatial resolution, integration of testing into manufacturing, use of interferometry for optimum assembly of complex systems, high-precision measurements in air with sub-nm accuracies, absolute calibration of residual errors, testing of aspheres with partial compensation and electronic hologram, measurement of fast processes, and temporally resolved measurements. The measurement and evaluation principle of the Direct 100 are described along with its optics, mechanics, and electronics.

Citation Download Citation

Michael F. Kuechel "New Zeiss interferometer", Proc. SPIE 1332, Optical Testing and Metrology III: Recent Advances in Industrial Optical Inspection, (1 January 1991); https://doi.org/10.1117/12.51116

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