SPEEDIE: a profile simulator for etching and deposition

James P. McVittie; Juan C. Rey; A. J. Bariya; M. M. IslamRaja; L. Y. Cheng; S. Ravi; Krishna C. Saraswat

doi:10.1117/12.48908

1 March 1991 SPEEDIE: a profile simulator for etching and deposition

James P. McVittie, Juan C. Rey, A. J. Bariya, M. M. IslamRaja, L. Y. Cheng, S. Ravi, Krishna C. Saraswat

Proceedings Volume 1392, Advanced Techniques for Integrated Circuit Processing; (1991) https://doi.org/10.1117/12.48908
Event: Processing Integration, 1990, Santa Clara, CA, United States

Abstract

SPEEDIE is a new physically based profile simulator for dry etching and LPCVD. It calculates angular and energy distributions of ions and fast neutrals using a Monte Carlo (MC) simulator for ion sheath transport. Fluxes at each point on the profile can be calculated using either MC or analytical methods which consider 3-D transport by molecular flow surface diffusion and adsorption/re-emission. Etch rates are determined using a choice of etch models while LPCVD uses a sticking coefficient model. A modified string algorithm which allows simultaneous etching and deposition is used to move the surface. Examples which match experiments are given for sloped oxide etching and oxide filling of trenches and vias.

Citation Download Citation

James P. McVittie, Juan C. Rey, A. J. Bariya, M. M. IslamRaja, L. Y. Cheng, S. Ravi, and Krishna C. Saraswat "SPEEDIE: a profile simulator for etching and deposition", Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); https://doi.org/10.1117/12.48908

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