Paper
1 August 1991 Application and integration of a focused ion beam circuit repair system
John A. Lange, Chris Allen
Author Affiliations +
Abstract
The use of focused ion beam (FIB) circuit repair systems has drastically affected the entire design cycle of modern integrated circuits. Product analysis is changing as well with the ability of a focussed ion beam system to make very accurate cuts on a die and then image the layers using differentiation by the primary ion beam. Transmission electron microscopy is also being positively affected by this new technique due to its ability to produce thinner samples with more positive location than were available by previous techniques. In order to maximize the return, this type of system is best utilized by many operators rather than a select dedicated group. The applications and the organization of use of one such system is described in the deign debug phase of the advanced microprocessor, the Motorola MC68040, along with some suggestions for future directions of focused ion beam machines.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John A. Lange and Chris Allen "Application and integration of a focused ion beam circuit repair system", Proc. SPIE 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing, (1 August 1991); https://doi.org/10.1117/12.47342
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CITATIONS
Cited by 3 scholarly publications.
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KEYWORDS
Ion beams

Metals

Ions

Manufacturing

X-ray lithography

X-rays

Etching

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