Paper
1 August 1991 Video-based alignment system for x-ray lithography
R. Emmett Hughlett, Keith A. Cooper
Author Affiliations +
Abstract
The fundamental aspects and implementation of the SUSS ALX alignment system for x-ray lithography are described. This paper details the algorithm, the logic behind the alignment target design, and the real-world overlay results achieved. The system reliably achieves an overlay accuracy of 150 nanometers at 3(sigma) being the norm. Focus repeatability is +/- 0.2 microns, including zero level. Alignment calculations are performed in less than 200 msecs. Focus finding is complete in 400 msec. The ALX is a three-camera video system imaging specified mask and wafer alignment patterns to perform coarse alignment of mask and wafer to the imaging field of view, fine alignment of mask to wafer, and automatic focus. The illumination is brightfield, white light. As an auxiliary function, the ALX is used to set planarity and gap of the mask and wafer, by means of fast autofocus. This allows for completely passive (non-contact) gap setting. Both alignment and autofocus on a high SNR image profiling technique for image preprocessing and data compression, here termed 'summed projection.' This vital operation is performed in hardware in true real-time (frame rate). An optical edge detection signal processing algorithm is applied to extract position information from the compressed video input signal.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
R. Emmett Hughlett and Keith A. Cooper "Video-based alignment system for x-ray lithography", Proc. SPIE 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing, (1 August 1991); https://doi.org/10.1117/12.47347
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CITATIONS
Cited by 5 scholarly publications.
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KEYWORDS
Optical alignment

Semiconducting wafers

Photomasks

X-ray lithography

Digital signal processing

Detection and tracking algorithms

Video

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