Optical characterization of photolithographic metal grids

Kurt A. Osmer; Mike Ivor Jones

doi:10.1117/12.46819

1 October 1991 Optical characterization of photolithographic metal grids

Kurt A. Osmer, Mike Ivor Jones

Proceedings Volume 1498, Tactical Infrared Systems; (1991) https://doi.org/10.1117/12.46819
Event: Southcentral '91 (Dallas), 1991, Dallas, TX, United States

Abstract

Infrared window materials for modern military aircraft must simultaneously provide adequate optical performance and maintain stringent shielding levels for electromagnetic interference (EMI). Microscopic metal grids deposited on the surface of dielectric windows can provide the conductivity necessary for proper radio frequency or RF shielding. This paper will examine the optical impact of three grid patterns designed for EMI suppression. Transmission blockage and beam diffraction in the far-field have been measured and compared to predicted values. A discussion of durability under severe thermal and rain erosion environments is also included.

Citation Download Citation

Kurt A. Osmer and Mike Ivor Jones "Optical characterization of photolithographic metal grids", Proc. SPIE 1498, Tactical Infrared Systems, (1 October 1991); https://doi.org/10.1117/12.46819

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