Fabrication of cold light mirror of film projector by direct electron-beam-evaporated TiO2 and SiO2 starting materials in neutral oxygen atmosphere

Di Sheng Zhong; Guang Zhong Xu; Wi Liu

doi:10.1117/12.47195

1 November 1991 Fabrication of cold light mirror of film projector by direct electron-beam-evaporated TiO₂ and SiO₂ starting materials in neutral oxygen atmosphere

Di Sheng Zhong, Guang Zhong Xu, Wi Liu

Author Affiliations +

Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47195
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China

Abstract

This paper introduces a process suitable to applied production of a cold light mirror of a film projector on a large scale. Deposition parameters required for producing a TiO₂/SiO₂ optical multilayer systems by electron beam evaporation of TiO₂ and SiO₂ starting materials are investigated. Manufacture and techniques of a cold mirror and the adhesion, stability, wear, and corrosion resistance of a cold mirror by this process are discussed. The results show that cold mirrors have good optical properties and better adhesion.

Citation Download Citation

Di Sheng Zhong, Guang Zhong Xu, and Wi Liu "Fabrication of cold light mirror of film projector by direct electron-beam-evaporated TiO₂ and SiO₂ starting materials in neutral oxygen atmosphere", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47195

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