Paper
1 November 1991 Investigation on the anomalous structure of the nanocrystal Ti and Zr films
W. Shi, J. Kong, H. Shen, Guo-Ping Du, W. Yao, Zhen Zhong Qi
Author Affiliations +
Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47214
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China
Abstract
The nanocrystal Ti and Zr films were prepared by dc magnetron sputtering method on a liquid N2 cooled copper substrate using Ti and Zr metal targets, respectively. The grain size of the Ti and Zr films is in the range of 5 - 12 nm, determined by both TEM observation and x- ray diffraction patterns using Warren-Averbach analysis. The structure anomaly for Ti and Zr films are found by means of electron diffraction as well as x-ray diffraction. The results of x- ray diffraction show that they are typical bcc structure for Ti films, which appears only at high temperature (more than 885 degree(s)C). The tattice parameter is 0.33178 nm close to that of the diffraction data extended from Ta-Ti alloys (JCPDS-5-628). For Zr nanocrystal films, the x-ray diffraction patterns show that it is (omega) -phase which appears only at high pressure above 39 kbar.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
W. Shi, J. Kong, H. Shen, Guo-Ping Du, W. Yao, and Zhen Zhong Qi "Investigation on the anomalous structure of the nanocrystal Ti and Zr films", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47214
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KEYWORDS
Zirconium

Nanocrystals

Diffraction

Sputter deposition

X-ray diffraction

Copper

Argon

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