Paper
1 December 1991 High-resolution electron microscopy of diamond film growth defects and their interactions
Dan Shechtman, Edward N. Farabaugh, Lawrence H. Robins, Albert Feldman, Jerry L. Hutchison
Author Affiliations +
Abstract
High resolution electron microscopy of plasma-assisted chemical vapor deposition (CVD) diamond films was performed. The film was fine-grained with a grain size of 0.1 micrometers . Several features of the microstructure were studied and their importance to the understanding of the diamond film growth was evaluated. The observations include: (1) Twinning density rises as a function of the distance from the center of the crystal. (2) The twins have an important role in the rapid growth of this kind of film The re-entrant angle between intersecting twins serves as a nucleation site for the growth of new (111) planes. (3) The center point of a twin quintuplet has five re-entrant angles and thus serves as a preferred nucleation site for new planes as the crystal grows. (4) Misfit boundaries, being the locus of intersection points of the growing planes on two adjacent twins, can serve as an indicator for the local crystal growth direction. The central nucleation site for the growing planes can thus, in many cases, be traced back to a quintuplet twin point.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Dan Shechtman, Edward N. Farabaugh, Lawrence H. Robins, Albert Feldman, and Jerry L. Hutchison "High-resolution electron microscopy of diamond film growth defects and their interactions", Proc. SPIE 1534, Diamond Optics IV, (1 December 1991); https://doi.org/10.1117/12.48277
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Cited by 4 scholarly publications.
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KEYWORDS
Diamond

Crystals

Chemical vapor deposition

Electron microscopy

Photomicroscopy

Silicon

Chemical species

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